Kestutis Grigoras

TL;DR: In this article, the authors demonstrate that excellent wettability and electrochemical properties in aqueous and organic electrolytes can be obtained by coating the porous silicon matrix with an ultra-thin layer of titanium nitride by atomic layer deposition.

TL;DR: The Virtual Project on the history of ALD (VPHA) is a volunteer-based effort with open participation, set up to make the early days of atomic layer deposition more transparent.

TL;DR: In this article, high aspect ratio silicon nanorod arrays by cyclic deep reactive ion etching (DRIE) process as a scaffold to enhance the energy density of a Si-based supercapacitor.

TL;DR: A ternary composite Si/TiN/MnO 2 taper nanorod array electrode for large specific capacitance on-chip supercapacitor is presented in this article.

TL;DR: Low noise platinum black or sputtered titanium nitride (TiN) microelectrodes are typically used for recording electrical activity of neuronal or cardiac cell cultures and transparent ALD TiN film is a suitable electrode material for producing functional MEAs.