L
Ludvik Martinu
Researcher at École Polytechnique de Montréal
Publications - 314
Citations - 9653
Ludvik Martinu is an academic researcher from École Polytechnique de Montréal. The author has contributed to research in topics: Thin film & Microstructure. The author has an hindex of 48, co-authored 313 publications receiving 8645 citations. Previous affiliations of Ludvik Martinu include Heinrich Hertz Institute & École Polytechnique.
Papers
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Plasma surface modification of polymers for improved adhesion: a critical review
TL;DR: A review of the development and trends in surface modification by low-pressure plasma treatment can be found in this paper, where reference is also made to other surface modification techniques, particularly to corona treatment, and comparisons are made wherever appropriate.
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Plasma deposition of optical films and coatings: A review
Ludvik Martinu,Daniel Poitras +1 more
TL;DR: In this article, the authors review the advances in the development of plasma processes and plasmasystems for the synthesis of thin film high and low index optical materials, and in the control of plasma surface interactions leading to desired film microstructures.
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Review Article: Stress in thin films and coatings: Current status, challenges, and prospects
Gregory Abadias,Eric Chason,Jozef Keckes,Marco Sebastiani,Gregory B. Thompson,Etienne Barthel,Gary L. Doll,Conal E. Murray,Chris H. Stoessel,Ludvik Martinu +9 more
TL;DR: In this paper, the authors summarized the recent advances, challenges, and prospects of both fundamental and applied aspects of stress in thin films and engineering coatings and systems, based on recent achievements presented during the 2016 Stress Workshop entitled “Stress Evolution in Thin Films and Coatings: from Fundamental Understanding to Control.
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OpenFilters: open-source software for the design, optimization, and synthesis of optical filters
Stéphane Larouche,Ludvik Martinu +1 more
TL;DR: The in-house software, called OpenFilters, is released under the GNU General Public License, an open-source license, and allows creation of multilayer and graded-index filters and calculation of reflection, transmission, absorption, phase, group delay, groupdelay dispersion, color, ellipsometric variables, admittance diagram, circle diagram, electric field distribution, and generation of reflection and transmission monitoring curves.
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Mechanical and optical properties of hard SiCN coatings prepared by PECVD
P. Jedrzejowski,J. Cizek,Aram Amassian,Jolanta E. Klemberg-Sapieha,Jaroslav Vlček,Ludvik Martinu +5 more
TL;DR: In this article, SiCN films were fabricated by PECVD from SiH4/CH4/N2/Ar gas mixtures at a temperature of 400 °C.