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Mildred S. Dresselhaus

Researcher at Massachusetts Institute of Technology

Publications -  763
Citations -  122381

Mildred S. Dresselhaus is an academic researcher from Massachusetts Institute of Technology. The author has contributed to research in topics: Carbon nanotube & Raman spectroscopy. The author has an hindex of 136, co-authored 762 publications receiving 112525 citations. Previous affiliations of Mildred S. Dresselhaus include University of California, Los Angeles & Universidade Federal de Minas Gerais.

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Synthesis and Characterization of Hexagonal Boron Nitride Film as a Dielectric Layer for Graphene Devices

TL;DR: The synthesis of large-area h-BN film is reported using atmospheric pressure chemical vapor deposition on a copper foil, followed by Cu etching and transfer to a target substrate, and the mobility of the CVD graphene device remains the same before and after device integration.
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Nanostructured Bulk Silicon as an Effective Thermoelectric Material

TL;DR: In this article, the authors used nanostructured bulk silicon with limited degradation in its electron mobility, leading to an unprecedented increase by a factor of 3.5 in its performance over that of the parent single-crystal material.
Book

Raman Spectroscopy in Graphene Related Systems

TL;DR: In this article, a detailed analysis of Raman Spectroscopy in Graphene Releated Systems is presented, including the G-band and time-independent perturbations.
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Enhancement of Thermoelectric Properties by Modulation-Doping in Silicon Germanium Alloy Nanocomposites

TL;DR: An alternative materials design is reported, using alloy Si(70) Ge(30) instead of Si as the nanoparticles and Si(95)Ge(5) as the matrix, to increase the power factor but not the thermal conductivity, leading to a ZT of 1.3 ± 0.1 at 900 °C.
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Power factor enhancement by modulation doping in bulk nanocomposites.

TL;DR: The concept of modulation doping in three-dimensional nanostructured bulk materials to increase the thermoelectric figure of merit is introduced via experiment using composites made of doped silicon nanograins and intrinsic silicon germanium grains.