P
Patricia Pimenta-Barros
Researcher at University of Grenoble
Publications - 27
Citations - 155
Patricia Pimenta-Barros is an academic researcher from University of Grenoble. The author has contributed to research in topics: Lithography & Etching (microfabrication). The author has an hindex of 4, co-authored 22 publications receiving 100 citations.
Papers
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Proceedings ArticleDOI
Vertically stacked-NanoWires MOSFETs in a replacement metal gate process with inner spacer and SiGe source/drain
Sylvain Barraud,V. Lapras,M.-P. Samson,L. Gaben,Laurent Grenouillet,V. Maffini-Alvaro,Yves Morand,J. Daranlot,N. Rambal,B. Previtalli,Shay Reboh,Claude Tabone,R. Coquand,E. Augendre,Olivier Rozeau,J.M. Hartmann,C. Vizioz,Christian Arvet,Patricia Pimenta-Barros,Nicolas Posseme,Virginie Loup,C. Comboroure,C. Euvrard,V. Balan,I. Tinti,G. Audoit,Nicolas Bernier,David Cooper,Zineb Saghi,F. Allain,A. Toffoli,O. Faynot,Maud Vinet +32 more
TL;DR: In this article, vertically stacked horizontal Si nano-wire (NW) /-MOSFETs fabricated with a replacement metal gate (RMG) process are integrated with inner spacers and SiGe source-drain (S/D) stressors.
Journal ArticleDOI
Atomic layer etching of GaN using Cl2 and He or Ar plasma
Simon Ruel,Patricia Pimenta-Barros,Frédéric Roux,Nicolas Chauvet,Michel Massardier,Philippe Thoueille,Shirley Tan,Daniel Shin,François Gaucher,Nicolas Posseme +9 more
TL;DR: In this article, the authors proposed to evaluate GaN etching performances through comparing the Cl2-based atomic layer etching (ALE) process with He or Ar as the sputtering gas.
Proceedings ArticleDOI
Sub-20nm hybrid lithography using optical, pitch-division, and e-beam
Jerome Belledent,Michael C. Smayling,Jonathan Pradelles,Patricia Pimenta-Barros,Sébastien Barnola,L. Mage,B. Icard,C. Lapeyre,Sébastien Soulan,Laurent Pain +9 more
TL;DR: It is shown that a conventional shaped beam system can already pattern the 11nm node Metal-1 layer with reasonable overlay margin and the combination of design style, optical lithography plus pitch-division, and e-beam lithography appears to provide a scaling path far into the future.
Journal ArticleDOI
PMMA removal selectivity to polystyrene using dry etch approach
Aurelien Sarrazin,Nicolas Posseme,Patricia Pimenta-Barros,Sébastien Barnola,Ahmed Gharbi,Maxime Argoud,Raluca Tiron,Christophe Cardinaud +7 more
TL;DR: In this paper, the etch mechanisms of the different films have been understood, thanks to x-ray photoelectron spectroscopy analyses performed on blanket wafers, and the best chemistries investigated and being able to remove PMMA selectively to PS have been validated on patterned polystyrene-block-poly(methyl methacrylate) copolymer structure.
Journal ArticleDOI
SiGe nano-heteroepitaxy on Si and SiGe nano-pillars.
M. Mastari,Matthew Charles,Y. Bogumilowicz,Q. M. Thai,Patricia Pimenta-Barros,Maxime Argoud,A.M. Papon,Patrice Gergaud,D. Landru,Y. Kim,Jean-Michel Hartmann +10 more
TL;DR: Results showed highly selective and uniform processes for the epitaxial growth of Si and SiGe nano-pillars in an industrial reduced pressure-chemical vapour deposition tool.