R
Runsheng Wang
Researcher at Peking University
Publications - 268
Citations - 2578
Runsheng Wang is an academic researcher from Peking University. The author has contributed to research in topics: Computer science & MOSFET. The author has an hindex of 23, co-authored 217 publications receiving 1940 citations.
Papers
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Journal ArticleDOI
Experimental Demonstration of Current Mirrors Based on Silicon Nanowire Transistors for Inversion and Subthreshold Operations
TL;DR: In this article, the silicon nanowire transistor (SNWT)-based circuits of current mirrors (NWCMs) have been successfully fabricated for the first time, and the key figures of merit of current mirror (CMs) are experimentally studied, including output voltage coefficient (OVC), output resistance, and dc matching error e.g.
Proceedings ArticleDOI
Impacts of non-negligible electron trapping/detrapping on the NBTI characteristics in silicon nanowire transistors with TiN metal gates
TL;DR: In this article, the negative bias temperature instability (NBTI) characteristics of silicon nanowire transistors with metal gates were experimentally studied and it was demonstrated that large amounts of as-grown defects, including both electron traps and hole traps, are induced by nanometre structure due to multiple surface crystal orientations of the cylinder nanowires.
Proceedings ArticleDOI
New insights into the near-threshold design in nanoscale FinFET technology for sub-0.2V applications
Xiaobo Jiang,Shaofeng Guo,Runsheng Wang,Yuan Wang,Xingsheng Wang,Binjie Cheng,Asen Asenov,Ru Huang +7 more
TL;DR: In this paper, a new methodology of near-threshold voltage (NTV) design optimization for FinFET is proposed for the first time, and demonstrated based on silicon data, and the proposed methodology is then demonstrated under Vdd =199mV and Vdd=145mV, targeting energy-efficiency priority and V dd priority, respectively.
Proceedings ArticleDOI
BEOL Compatible 15-nm Channel Length Ultrathin Indium-Tin-Oxide Transistors with I on = 970 μA/μm and On/off Ratio Near 10 11 at V ds = 0.5 V
Shengman Li,Mengchuan Tian,Chengru Gu,Runsheng Wang,Mengfei Wang,Xiong Xiong,Xuefei Li,Ru Huang,Yanqing Wu +8 more
TL;DR: In this paper, the authors report high-speed ultrathin-body (3.5 nm) indium-tin-oxide (ITO) transistors using high-k HfLaO dielectrics with a thickness of 5 nm.
Journal ArticleDOI
Characterization of Random Telegraph Noise in Scaled High-κ/Metal-Gate MOSFETs with SiO2/HfO2 Gate Dielectrics
TL;DR: In this article, the authors improved the characterization method based on clustering and Hidden Markov Model, which greatly enhances the ability to extract RTN with non-negligible "ghost noise" in high-κ MOSFETs.