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Runsheng Wang

Researcher at Peking University

Publications -  268
Citations -  2578

Runsheng Wang is an academic researcher from Peking University. The author has contributed to research in topics: Computer science & MOSFET. The author has an hindex of 23, co-authored 217 publications receiving 1940 citations.

Papers
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Proceedings Article

Deep understanding of AC RTN in MuGFETs through new characterization method and impacts on logic circuits

TL;DR: A new AC RTN characterization method is proposed, which can simply catch the missing RTN statistics beyond the narrow “detectable window” of VG in conventional DC RTN method, thus is powerful for studying RTN under practical full-swing AC bias.
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A Device-Level Characterization Approach to Quantify the Impacts of Different Random Variation Sources in FinFET Technology

TL;DR: In this article, a simple device-level characterization approach to quantitatively evaluate the impacts of different random variation sources in FinFETs is proposed, and the effectiveness of the proposed method is confirmed through both TCAD simulations and experimental results.
Proceedings ArticleDOI

New observations on AC NBTI induced dynamic variability in scaled high-κ/Metal-gate MOSFETs: Characterization, origin of frequency dependence, and impacts on circuits

TL;DR: In this paper, the frequency dependence of the dynamic variation induced by AC NBTI aging in scaled high-κ/metal-gate devices is experimentally studied for the first time, and the results are helpful for the future variability-aware circuit design.
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The Localized-SOI MOSFET as a Candidate for Analog/RF Applications

TL;DR: In this paper, the authors investigated the characteristics of localized-SOI MOSFETs for analog/RF applications, where the source and drain regions are quasi-surrounded by L-type oxide layers to reduce junction capacitance and avoid source/drain punchthrough, while the channel is directly connected with the substrate to alleviate the self-heating effect.