R
Runsheng Wang
Researcher at Peking University
Publications - 268
Citations - 2578
Runsheng Wang is an academic researcher from Peking University. The author has contributed to research in topics: Computer science & MOSFET. The author has an hindex of 23, co-authored 217 publications receiving 1940 citations.
Papers
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Proceedings Article
Deep understanding of AC RTN in MuGFETs through new characterization method and impacts on logic circuits
Jibin Zou,Runsheng Wang,Mulong Luo,Ru Huang,Nuo Xu,Pengpeng Ren,Changze Liu,Weize Xiong,Jianping Wang,Jinhua Liu,Jingang Wu,Waisum Wong,Shaofeng Yu,Hanming Wu,Shiuh-Wuu Lee,Yangyuan Wang +15 more
TL;DR: A new AC RTN characterization method is proposed, which can simply catch the missing RTN statistics beyond the narrow “detectable window” of VG in conventional DC RTN method, thus is powerful for studying RTN under practical full-swing AC bias.
Proceedings ArticleDOI
New insights into the design for end-of-life variability of NBTI in scaled high-κ/metal-gate Technology for the nano-reliability era
Pengpeng Ren,Runsheng Wang,Zhigang Ji,Peng Hao,Xiaobo Jiang,Shaofeng Guo,Mulong Luo,M. Duan,Jian Fu Zhang,Jianping Wang,Jinhua Liu,Weihai Bu,Jingang Wu,Waisum Wong,Shaofeng Yu,Hanming Wu,Shiuh-Wuu Lee,Nuo Xu,Ru Huang +18 more
TL;DR: In this article, a new methodology for the assessment of end-of-life variability of NBTI is proposed for the first time, by introducing the concept of characteristic failure probability, the uncertainty in the predicted 10-year VDD is addressed.
Journal ArticleDOI
A Device-Level Characterization Approach to Quantify the Impacts of Different Random Variation Sources in FinFET Technology
TL;DR: In this article, a simple device-level characterization approach to quantitatively evaluate the impacts of different random variation sources in FinFETs is proposed, and the effectiveness of the proposed method is confirmed through both TCAD simulations and experimental results.
Proceedings ArticleDOI
New observations on AC NBTI induced dynamic variability in scaled high-κ/Metal-gate MOSFETs: Characterization, origin of frequency dependence, and impacts on circuits
Changze Liu,Pengpeng Ren,Runsheng Wang,Ru Huang,Jiaojiao Ou,Qianqian Huang,Jibin Zou,Jianping Wang,Jingang Wu,Shaofeng Yu,Hanming Wu,Shiuh-Wuu Lee,Yangyuan Wang +12 more
TL;DR: In this paper, the frequency dependence of the dynamic variation induced by AC NBTI aging in scaled high-κ/metal-gate devices is experimentally studied for the first time, and the results are helpful for the future variability-aware circuit design.
Journal ArticleDOI
The Localized-SOI MOSFET as a Candidate for Analog/RF Applications
TL;DR: In this paper, the authors investigated the characteristics of localized-SOI MOSFETs for analog/RF applications, where the source and drain regions are quasi-surrounded by L-type oxide layers to reduce junction capacitance and avoid source/drain punchthrough, while the channel is directly connected with the substrate to alleviate the self-heating effect.