scispace - formally typeset
Open AccessJournal ArticleDOI

Electronic doping and scattering by transition metals on graphene

Reads0
Chats0
TLDR
In this paper, the effects of transition metals (TM) on the electronic doping and scattering in graphene using molecular-beam epitaxy combined with in situ transport measurements were investigated, and it was shown that at high coverage, Pt films are able to produce doping that is either $n$ type or weakly $p$ type.
Abstract
We investigate the effects of transition metals (TM) on the electronic doping and scattering in graphene using molecular-beam epitaxy combined with in situ transport measurements. The room-temperature deposition of TM onto graphene produces clusters that dope $n$ type for all TM investigated (Ti, Fe, and Pt). We also find that the scattering by TM clusters exhibits different behavior compared to $1/r$ Coulomb scattering. At high coverage, Pt films are able to produce doping that is either $n$ type or weakly $p$ type, which provides experimental evidence for a strong interfacial dipole favoring $n$-type doping as predicted theoretically.

read more

Content maybe subject to copyright    Report

UC Riverside
UC Riverside Previously Published Works
Title
Electronic doping and scattering by transition metals on graphene
Permalink
https://escholarship.org/uc/item/2602b784
Journal
Physical Review B - Condensed Matter and Materials Physics, 80(7)
ISSN
1098-0121
Authors
Pi, K
McCreary, KM
Bao, W
et al.
Publication Date
2009-09-21
DOI
10.1103/PhysRevB.80.075406
Peer reviewed
eScholarship.org Powered by the California Digital Library
University of California

Electronic doping and scattering by transition metals on graphene
K. Pi, K. M. McCreary, W. Bao, Wei Han, Y. F. Chiang, Yan Li, S.-W. Tsai, C. N. Lau, and R. K. Kawakami
*
Department of Physics and Astronomy, University of California, Riverside, California 92521, USA
Received 10 June 2009; published 5 August 2009
We investigate the effects of transition metals TM on the electronic doping and scattering in graphene
using molecular-beam epitaxy combined with in situ transport measurements. The room-temperature deposi-
tion of TM onto graphene produces clusters that dope n type for all TM investigated Ti, Fe, and Pt. We also
find that the scattering by TM clusters exhibits different behavior compared to 1/ r Coulomb scattering. At high
coverage, Pt films are able to produce doping that is either n type or weakly p type, which provides experi-
mental evidence for a strong interfacial dipole favoring n-type doping as predicted theoretically.
DOI: 10.1103/PhysRevB.80.075406 PACS numbers: 73.63.b, 72.10.Fk, 73.23.b, 73.40.Ns
I. INTRODUCTION
Transition-metal TM adatoms and clusters on graphene
have recently been a topic of great interest: at low density,
they are expected to induce doping, scattering,
1
and novel
magnetic
24
and superconducting
5
behavior; at high density
up to continuous coverage, they may locally dope or
modify the band structure of graphene.
68
Because of their
importance for graphene-based electronics and the investiga-
tion of novel phenomena,
114
there have been extensive the-
oretical studies.
18,13,14
In contrast, the experimental explora-
tion of TM/graphene systems is much more limited.
A key issue to investigate is the charge transfer between
the TM and graphene because it is responsible for both the
local doping and the charged impurity scattering. Generally,
the relative work function WF between the TM and the
graphene is believed to be an important factor for determin-
ing the charge transfer,
11
i.e., graphene will be p doped
n doped if the TM’s WF is larger smaller than graphene.
Recently, density-functional calculations predict the presence
of a strong interfacial dipole that promotes the n-type doping
of graphene.
8
However, experimental studies of the local
doping by TM contacts have yet to find evidence for this
strong interfacial dipole layer.
912
In this work, we report in situ transport measurements of
TM/graphene systems as a function of TM coverage for sev-
eral different metals using a molecular-beam epitaxy MBE
deposition system with built-in electrical probes. Similar
techniques have been applied to study gases,
15
molecules,
16
and alkali-metal
17
adatoms on graphene. The metals used in
the study are Ti, Fe, and Pt, with WF of 4.3, 4.7, and 5.9
eV,
18
respectively the WF of graphene is 4.5 eV Refs. 19
and 20兲兴. Surprisingly, at low coverage, the TM clusters dope
graphene n type, regardless of its WF relative to that of
graphene. For the scattering at low coverage, we find that the
scattering by TM clusters exhibits different behavior com-
pared to 1/ r Coulomb scattering. Extending to high cover-
age, we make the important observation that Pt films are able
to produce doping that is either n type or weakly p type.
Because WF considerations alone would predict strong
p-type doping, this result provides experimental evidence for
the strong interfacial dipole favoring n-type doping as calcu-
lated theoretically.
8
II. EXPERIMENTAL PROCEDURES
Samples are prepared by mechanical exfoliation of Kish
graphite onto a SiO
2
/ Si substrate 300 nm thickness of
SiO
2
. Single-layer graphene flakes are identified by optical
microscopy and Raman spectroscopy.
21
Figure 1a shows a
scanning electron microscope SEM image of a typical
graphene device with Au/Ti electrodes defined by e-beam
lithography. The device is annealed under Ar/ H
2
environ-
ment at 200 °C for1htoremove resist residue
22,23
and
degassed in ultrahigh vacuum at 90 °C for 1 h. The room-
temperature MBE deposition of TM atoms growth
No Pt (0 ML)
0.025 ML
0.071 ML
0.4
0.6
0.2
0.0
-50 0 50
(e) Pt-1
0.127 ML
-100
No Fe (0 ML)
0.041 ML
Gate Voltage (V)
(d) Fe-1
Conductivity (mS)
2.0
No Ti (0 ML)
0.0038 ML
0.0077 ML
0.015 ML
(c) Ti-1
2.0
0.5
1.5
1.0
0.0
0.123 ML
0.205 ML
1.0
1.5
0.5
0.0
0nm
10 n
m
2 μm
(a)
(b)
FIG. 1. Color兲共a SEM image of a graphene device with
Au100 nm/Ti10 nm electrodes. b AFM image of 0.01 ML of Pt
deposited on single-layer graphene. 关共ce兲兴 The gate-dependent
conductivity at selected TM coverage for Ti, Fe, and Pt,
respectively.
PHYSICAL REVIEW B 80, 075406 2009
1098-0121/2009/807/0754065 ©2009 The American Physical Society075406-1

pressure7 10
−10
torr is calibrated by a quartz deposition
monitor. The coverage is converted from atoms/ cm
2
to
“monolayers” ML, where 1 ML is defined as 1.908
10
15
atoms/ cm
2
, the areal density of primitive unit cells in
graphene. For low coverage, the room-temperature deposi-
tion of TM leads to clustering as shown in the atomic force
microscope AFM image of 0.01 ML Pt on graphene Fig.
1b. The presence of isolated adatoms cannot be ruled out
by the AFM but are unfavorable theoretically.
6
In situ trans-
port measurements are performed using standard lock-in de-
tection 1
A excitation.
III. RESULTS AND DISCUSSION
The fine control of TM deposition provides the ability to
probe the effect of small amounts of material on the transport
properties of graphene. Figure 1c shows representative
gate-dependent conductivity scans for various thicknesses of
Ti in the low-coverage regime. The minimum in the gate-
dependent conductivity identifies the position of the Dirac
point V
D
while the slope corresponds to the mobility of
charge carriers in the graphene. With increasing coverage,
two characteristic behaviors are observed. First, the introduc-
tion of Ti on the graphene surface results in shifting the
Dirac point toward more negative gate voltages, indicating
that the Ti is a donor, producing n-type doping in the
graphene. Second, the slope of the conductance curves away
from the Dirac point decreases, indicating that the Ti intro-
duces additional scattering to lower the mobility. Both of
these characteristics are also observed for Fe doping Fig.
1d and Pt doping Fig. 1e.
Figure 2 highlights the relation between the Dirac point
shift V
D,shift
=V
D
−V
D,initial
and TM coverage for a collec-
tion of Ti, Fe, and Pt samples in the low-coverage regime.
Despite the sample-to-sample variations which may be due
to differences in the graphene surface purity, growth rate
uncertainties, and the possible dependence of graphene WF
on flake size or edge roughness,
24
several important features
are discovered. First, all samples, including the Pt samples
with WF greater than graphene, result in n-type doping. Sec-
ond, the three different TM result in three different ranges for
slopes, with the Ti samples exhibiting the most negative ini-
tial slopes 2169 to 4602 V/ ML. From this value the
doping efficiency or number of electrons transferred per Ti
atom to graphene is determined by knowing the carrier con-
centration associated with the given change in gate voltage
n =
V
g
, where
=7.2 10
10
V
−1
cm
−2
based on calcu-
lated capacitance values. The doping efficiency is in the
range of 0.082–0.174 electrons per Ti atom. The Fe shows
the next strongest efficiency 0.017 to 0.046 while the Pt is
the weakest electron donor with the efficiency of 0.014 to
0.021 electrons transferred for each Pt atom. Upon recalling
the bulk WFs of Ti 4.3 eV,Fe4.7 eV, and Pt 5.9 eV,it
is apparent that the WF of the TM is related to the doping
efficiency, with electrons being more easily transferred from
the lowest WF material, Ti, compared to the highest WF
material, Pt. However, the magnitudes of the doping effi-
ciency do not vary linearly with the WF of the TM. There-
fore, in addition to the work function, other effects such as
wave-function hybridization or structural modifications may
contribute to the electronic doping of graphene.
Figures 3a3c show the conductivity as a function of
carrier concentration n=−
V
g
–V
D
兲兴. The electron and
hole mobilities are determined by taking the slope of the
conductivity away from the Dirac point
e,h
=
/ en兩兲.
15,17
Figures 3d3f illustrate the de-
tailed dependence of mobility on the TM coverage for Ti, Fe,
and Pt samples in the low-coverage regime. Comparing the
different samples at equivalent coverages, the Ti exhibits the
strongest scattering and Pt has the weakest scattering. Noting
that the trend in the scattering TiPt matches that of the
doping efficiency, we investigate this relationship by plotting
the normalized mobility
25
against the Dirac point shift Fig.
3g. The average mobility,
=
e
+
h
/ 2, is plotted for Ti
and Pt. The Fe samples typically exhibit a reduction in hole
mobility which is most pronounced in sample Fe-2, so
e
and
h
are plotted separately. Comparing the different mate-
rials shows that the mobility reduction in Ti, Pt, and Fe elec-
trons is much more strongly related to the Dirac point shift
than the TM coverage Fig. 3g. Because the Dirac point
shift not only measures the doping level in the graphene but
also the average charge density of the TM, the data shows
that the scattering is related to the average charge density of
the clusters—a characteristic, that is, plausible for Coulomb
scattering. However, we point out that this behavior is actu-
ally different from what is calculated for Coulomb scattering
by pointlike scatterers with 1/ r potential.
26
Specifically, in
Ref. 26, the scattering per impurity does not scale linearly
with the impurity charge
and instead has a strong qua-
dratic component, resulting in scattering that scales as
2
n
imp
=
n
imp
兲⬃
V
D,shift
. Due to the presence of the
material-dependent
factor i.e., doping efficiency, the
mobility vs Dirac point shift curves should be significantly
different for different materials. Therefore, the observed scat-
tering by TM clusters exhibits behavior that differs from 1/ r
Coulomb scattering by isolated impurities.
1
Additionally, we analyze the power-law relationship be-
tween the scattering and doping effects. The total scattering
rate is =
0
+
TM
, where
0
is the scattering rate of the
Pt-1
Pt-2
Fe-2
Fe-1
Fe-3
Ti-1
Ti-2
Ti-3
TM Covera
g
e
(
ML
)
-40
0
-80
-120
0.000 0.025 0.050 0.075
0.1
0.2
0.3
F
erm
iL
eve
l Shif
t
(
e
V)
0
Pt-3
V
D,shift
(
V
)
FIG. 2. Color Dirac point shift vs coverage for nine separate
samples. The dashed lines indicate the linear fit used to define the
doping efficiencies, which are: 0.174, 0.092, and 0.082 electrons/
atom for Ti-1, Ti-2, and Ti-3, respectively; 0.017, 0.040, and 0.046
electrons/atom for Fe-1, Fe-2, and Fe-3, respectively; 0.014, 0.021,
and 0.019 electrons/atom for Pt-1, Pt-2, and Pt-3, respectively.
PI et al. PHYSICAL REVIEW B 80, 075406 2009
075406-2

undoped sample and
TM
is the scattering rate induced by the
TM. Because mobility is inversely proportional to scattering,
the quantity 1/
−1/
0
is proportional to
TM
. The relation-
ship between the Dirac point shift and
TM
is investigated by
plotting V
D,shift
vs 1/
−1/
0
on a log-log scale Fig.
3h. The dashed lines are power-law fits, V
D,shift
⬃共
TM
b
, with values of b ranging from 0.64–1.01 as indi-
cated in the figure caption. Compared to the results of Chen
et al.
17
which find values of b =1.21.3 for scattering by
isolated potassium impurities, our results with b 1 indicate
a different behavior for scattering by TM clusters.
A surprising result from the studies at low coverage Figs.
13 is the n-type doping of graphene by Pt. If the WF is the
only factor affecting the transfer of electrons between mate-
rials, Pt is expected to dope graphene strongly p type, since
the WF of Pt 5.9 eV is significantly larger than that of
graphene 4.5 eV. Density-functional calculations of bulk
TM on graphene
8
present a possible explanation for this ob-
served behavior by predicting the formation of an interfacial
dipole layer resulting in a potential step to favor n-type dop-
ing V=0.9 eV. So far, however, there has been no ex-
perimental evidence for such a strong dipole layer forming at
the interface between a bulk TM and graphene.
912
To inves-
tigate the theoretical prediction of a strong interfacial dipole
layer between the graphene and bulk TM, we extend the
Pt-doping study to higher coverage to study the charge trans-
fer from Pt films. Figure 4a displays V
D
as a function of
coverage for several Pt-doped samples. An initial rapid shift
toward negative voltages is observed in all samples. As more
Pt is deposited, bringing the sample into the medium-
coverage regime, the rate of shift in V
D
slows and reaches a
minimum value before gradually increasing toward more
positive voltages. At high coverage, the Dirac point stabilizes
and shows very little variation with additional deposition.
The sample morphology is measured by ex situ AFM. The
AFM image for 0.62 ML of Pt shows that the Pt is still in the
form of isolated clusters Fig. 4b. At the higher coverage
of 3.19 ML, the Pt forms a connected film with some uncov-
ered regions of graphene Fig. 4c. The connected film pro-
vides a parallel conduction pathway that contributes to the
measured conductivity value but should not be gate depen-
dent. The gate dependence of the conductivity is primarily
due to the chemical-potential shift in the graphene that is not
covered by the metal. For graphene in direct contact with the
metal, the local chemical potential is pinned, exhibiting no
gate dependence. However, the gate dependence of the un-
covered graphene regions and the voltage of the conductance
minima V
D
still provide a reliable measure of the electronic
-V
D,shift
(V)
1.0
0.5
0.0
0
-20 -40 -60 -8
0
Normalized mobility, μ/μ
0
Dirac Point Shift (V)
0.008 ML
0.029 ML
Pt-1
Pt-2
Pt-3
Ti-1
Ti-2
Fe-2 electron
Fe-2 hole
10
-4
10
-3
1/μ-1/μ
0
(Vs/cm
2
)
No Ti
0.0038 ML
0.0077 ML
0.015 ML
No Fe
0.003 ML
0.012 ML
0.018 ML
No Pt
0.0051 ML
0.010 ML
0.018 ML
Electron
Hole
-3 0 3
2.0
1.0
0.0
0 0.01 0.02
3
2
1
2.0
1.0
0.0
3
2
1
3
2
1
0.5
0.0
1.5
1.0
Electron
Hole
Electron
Hole
n (10
12
cm
-2
)
Conductivity (mS)
Coverage (ML)
Mobility, μ (10
3
cm
2
/Vs)
Pt-1
Pt-2
Pt-3
Ti-1
Ti-2
Fe-2 electron
Fe-2 hole
(a)
(b)
(c)
(d)
(e)
(f)
(g)
Fe-2
Ti-1
Pt-2
(h)
0.102 ML
FIG. 3. Color兲关ac兲兴 The conductivity vs carrier concentra-
tion for Ti, Fe, and Pt, respectively, for four different TM coverages.
关共df兲兴 The electron and hole mobilities for Ti, Fe, and Pt, respec-
tively, as a function of TM coverage. g The normalized mobility
/
0
vs Dirac point shift. The data points corresponding to 0.102
ML Pt, 0.008 ML Ti, and 0.029 ML Fe on samples Pt-1, Ti-1, and
Fe-2 are circled. h −V
D,shift
is plotted vs 1/
–1/
0
. The dashed
lines are power-law fits to the equation, V
D,shift
⬃共
TM
b
, where
b is 0.64, 1.01, 0.85, 0.83, 0.86, and 0.95 for Ti-1, Ti-2, Pt-1, Pt-2,
Pt-3, and Fe-2 electrons, respectively.
0nm
10 nm
3.19 ML
0.62 ML
02468
0 0.87 1.75 2.62 3.50
0
-40
-80
-120
-160
Pt Coverage (ML)
Pt Coverage (
Å
)
Dirac Point
(
V
)
AFM 1
AFM 2
AFM 1
AFM 2
(b) (c)
(a)
Pt-3
Pt-4
Pt-5
Pt-6
FIG. 4. Color兲共a The Dirac point as a function of Pt coverage
up to high coverage. b AFM image of 0.62 ML Pt exhibits isolated
clusters. c AFM image of 3.19 ML Pt indicates a connected film
with some areas of bare graphene.
ELECTRONIC DOPING AND SCATTERING BY PHYSICAL REVIEW B 80, 075406 2009
075406-3

doping by the TM due to the continuity of the chemical
potential. Thus, the final values of V
D
in the high-coverage
regime clearly show that Pt films can produce either n-type
or weak p-type doping of the graphene. This sample-to-
sample variation is most likely due to differences in the ini-
tial surface purity among samples. Although hydrogen clean-
ing is performed on all samples, trace amounts of resist
residue could remain, directly affecting the TM-graphene
spacing. Due to the highly spacing-dependent interfacial di-
pole strength,
8
any variation in the spacing will directly af-
fect the type and amount of doping. The fact that n-type
doping is observed provides experimental evidence for the
presence of a strong interfacial dipole layer favoring n-type
doping as predicted theoretically
8
because the expected dop-
ing based only on WF considerations would lead to strong
p-type doping.
An interfacial dipole whose strength decreases with in-
creasing equilibrium spacing d
eq
兲共Ref. 8 provides a pos-
sible explanation for the nonmonotonic behavior of the Dirac
point shift in Pt samples. Based on theoretical calculations,
the d
eq
between TM adatoms and graphene is less than 3 Å
Ref. 6 while for bulk TM the distance increases to
3.3 Å.
8
The n-type doping observed in samples at low
coverage is an indication of a strong interfacial dipole favor-
ing n-type doping, as expected for low coverages exhibiting
a small d
eq
. As the bulklike regime is approached, the in-
creasing d
eq
decreases the dipole strength and hence reduces
the n-type doping efficiency as observed by the shift in the
Dirac point toward positive voltages. We emphasize that the
interfacial dipole provides just one possible scenario to ex-
plain the nonmonotonic evolution of the Dirac point shift. A
quantitative understanding is complicated by the fact that the
WF can differ from bulk values for small clusters 4nm
lateral size兲共Ref. 27 and the corresponding quantity for ada-
toms should they be present is the first ionization energy.
Therefore, further theoretical calculations are needed to fully
understand the doping effect of clusters. Regardless of the
exact mechanism for doping by clusters, an interfacial dipole
is still necessary to explain the n-type or weak p-type doping
measured in the bulklike regime.
IV. CONCLUSION
In conclusion, the exploration of TM/graphene systems
leads to several important observations. At low coverage, the
doping efficiency is found to be related to the TM WFs but
Ti, Fe, and Pt all exhibit n-type doping even for materials
with higher WF than graphene i.e., Fe and Pt. Extending
the Pt-doping study to higher thickness, the doping can either
be n type or weakly p type. Because WF considerations
alone would generate strong p-type doping, this result pro-
vides experimental evidence for the strong interfacial dipole
favoring n-type doping as predicted by theory.
8
Analysis of
the scattering at low coverage indicates that the scattering by
TM clusters exhibits different behavior compared to 1/ r
Coulomb scattering.
ACKNOWLEDGMENTS
We acknowledge helpful discussions with F. Guinea and
M. Fuhrer. We acknowledge the support of ONR Grant No.
N00014-09-1-0117, NSF Grants No. CAREER DMR-
0450037, No. CAREER DMR-0748910, and No. MRSEC
DMR-0820414, and CNID Grant No. ONR/DMEA-
H94003-07-2-0703.
*
roland.kawakami@ucr.edu
1
M. I. Katsnelson, F. Guinea, and A. K. Geim, Phys. Rev. B 79,
195426 2009.
2
B. Uchoa, V. N. Kotov, N. M. R. Peres, and A. H. Castro Neto,
Phys. Rev. Lett. 101, 026805 2008.
3
B. Uchoa, C.-Y. Lin, and A. H. Castro Neto, Phys. Rev. B 77,
035420 2008.
4
A. V. Krasheninnikov, P. O. Lehtinen, A. S. Foster, P. Pyykko,
and R. M. Nieminen, Phys. Rev. Lett. 102, 126807 2009.
5
B. Uchoa and A. H. Castro Neto, Phys. Rev. Lett. 98, 146801
2007.
6
K. T. Chan, J. B. Neaton, and M. L. Cohen, Phys. Rev. B 77,
235430 2008.
7
Y. Mao, J. Yuan, and J. Zhong, J. Phys.: Condens. Matter 20,
115209 2008.
8
G. Giovannetti, P. A. Khomyakov, G. Brocks, V. M. Karpan, J.
van den Brink, and P. J. Kelly, Phys. Rev. Lett. 101, 026803
2008.
9
E. J. H. Lee, K. Balasubramanian, R. T. Weitz, M. Burghard, and
K. Kern, Nat. Nanotechnol. 3, 486 2008.
10
F. Xia, T. Mueller, R. Golizadeh-Mojarad, M. Freitag, Y.-M. Lin,
J. C. Tsang, V. Perebeinos, and P. Avouris, Nano Lett. 9, 1039
2009.
11
B. Huard, N. Stander, J. A. Sulpizio, and D. Goldhaber-Gordon,
Phys. Rev. B 78, 121402 2008.
12
J. Park, Y. H. Ahn, and C. Ruiz-Vargas, Nano Lett. 9, 1742
2009.
13
H. Sevincli, M. Topsakal, E. Durgun, and S. Ciraci, Phys. Rev. B
77, 195434 2008.
14
M. I. Rojas and E. P. M. Leiva, Phys. Rev. B 76, 155415 2007.
15
F. Schedin, A. K. Geim, S. V. Morozov, E. W. Hill, P. Blake, M.
I. Katsnelson, and K. S. Novoselov, Nature Mater. 6, 652
2007.
16
D. B. Farmer, R. Golizadeh-Mojarad, V. Perebeinos, Y.-M. Lin,
G. S. Tulevski, J. C. Tsang, and P. Avouris, Nano Lett. 9, 388
2009.
17
J.-H. Chen, C. Jang, S. Adam, M. S. Fuhrer, E. D. Williams, and
M. Ishigami, Nat. Phys. 4, 377 2008.
18
CRC Handbook of Chemistry and Physics CRC Press, Boca
Raton, FL, 2008.
19
S. J. Sque, R. Jones, and P. R. Briddon, Phys. Status Solidi A
204, 3078 2007.
20
N. Ooi, A. Rairkar, and J. B. Adams, Carbon 44, 231 2006.
21
A. C. Ferrari, J. C. Meyer, V. Scardaci, C. Casiraghi, M. Lazzeri,
F. Mauri, S. Piscanec, D. Jiang, K. S. Novoselov, S. Roth, and
A. K. Geim, Phys. Rev. Lett. 97, 187401 2006.
PI et al. PHYSICAL REVIEW B 80, 075406 2009
075406-4

Figures
Citations
More filters
Journal ArticleDOI

Graphene Spintronics

TL;DR: The experimental and theoretical state-of-art concerning spin injection and transport, defect-induced magnetic moments, spin-orbit coupling and spin relaxation in graphene are reviewed.
Journal ArticleDOI

Properties of graphene: a theoretical perspective

TL;DR: In this article, the authors provide an in-depth description of the physics of monolayer and bilayer graphene fermions, where the quasiparticles are massive chiral Dirac Fermions.
Journal ArticleDOI

Ion and electron irradiation-induced effects in nanostructured materials

TL;DR: In this article, the authors review recent progress in the understanding of effects of irradiation on various zero-dimensional and one-dimensional nanoscale systems, such as semiconductor and metal nanoclusters and nanowires, nanotubes, and fullerenes.
Journal ArticleDOI

Colloquium: The transport properties of graphene: An introduction

TL;DR: In this paper, an introduction to the transport properties of graphene combining experimental results and theoretical analysis is presented, where simple intuitive models are used to illustrate important points on the transport property of graphene.
Journal ArticleDOI

25th Anniversary Article: Chemically Modified/Doped Carbon Nanotubes & Graphene for Optimized Nanostructures & Nanodevices

TL;DR: An overview of the practical benefits from chemical modification/doping, including the controllability of electronic energy level, charge carrier density, surface energy and surface reactivity for diverse advanced applications is presented, namely flexible electronics/optoelectronics, energy conversion/storage, nanocomposites, and environmental remediation.
References
More filters
Journal ArticleDOI

Influence of metal contacts and charge inhomogeneity on transport properties of graphene near the neutrality point

TL;DR: In this paper, the charge inhomogeneity induced by spurious chemical doping or metal contacts can lead to large systematic errors in assessing graphene's transport properties and, in particular, its minimal conductivity.
Journal ArticleDOI

Al doped graphene : A promising material for hydrogen storage at room temperature

TL;DR: In this paper, a promising material for hydrogen storage at room temperature was proposed theoretically by using density functional theory calculation, and a hydrogen storage capacity of 5.13% was predicted at T = 300 K and P = 0.260 eV/H2.
Journal ArticleDOI

Al doped graphene: A promising material for hydrogen storage at room temperature

TL;DR: In this paper, a promising material for hydrogen storage at room temperature-Al doped graphene was proposed theoretically by using density functional theory calculation, and hydrogen storage capacity of 5.13 wt% was predicted at T = 300 K and P = 0.1 Gpa with adsorption energy Eb = -0.260 eV/H2.
Related Papers (5)
Frequently Asked Questions (21)
Q1. What is the effect of the dipole on the conductivity?

As the bulklike regime is approached, the increasing deq decreases the dipole strength and hence reduces the n-type doping efficiency as observed by the shift in the Dirac point toward positive voltages. 

the introduction of Ti on the graphene surface results in shifting the Dirac point toward more negative gate voltages, indicating that the Ti is a donor, producing n-type doping in the graphene. 

In this paper, the authors show that at low coverage, the scattering behavior of TM clusters exhibits different behavior compared to 1 /r Coulomb scattering. 

the slope of the conductance curves away from the Dirac point decreases, indicating that the Ti introduces additional scattering to lower the mobility. 

Although hydrogen cleaning is performed on all samples, trace amounts of resist residue could remain, directly affecting the TM-graphene spacing. 

The gate dependence of the conductivity is primarily due to the chemical-potential shift in the graphene that is not covered by the metal. 

The n-type doping observed in samples at low coverage is an indication of a strong interfacial dipole favoring n-type doping, as expected for low coverages exhibiting a small deq. 

At low coverage, the doping efficiency is found to be related to the TM WFs but Ti, Fe, and Pt all exhibit n-type doping even for materials with higher WF than graphene i.e., Fe and Pt . 

Due to the highly spacing-dependent interfacial dipole strength,8 any variation in the spacing will directly affect the type and amount of doping. 

in addition to the work function, other effects such as wave-function hybridization or structural modifications may contribute to the electronic doping of graphene. 

Density-functional calculations of bulk TM on graphene8 present a possible explanation for this observed behavior by predicting the formation of an interfacial dipole layer resulting in a potential step to favor n-type doping V=0.9 eV . 

The total scattering rate is = 0+ TM, where 0 is the scattering rate of the075406-2undoped sample and TM is the scattering rate induced by the TM. 

The fact that n-type doping is observed provides experimental evidence for the presence of a strong interfacial dipole layer favoring n-type doping as predicted theoretically8 because the expected doping based only on WF considerations would lead to strong p-type doping. 

Because WF considerations alone would generate strong p-type doping, this result provides experimental evidence for the strong interfacial dipole favoring n-type doping as predicted by theory. 

Upon recalling the bulk WFs of Ti 4.3 eV , Fe 4.7 eV , and Pt 5.9 eV , it is apparent that the WF of the TM is related to the doping efficiency, with electrons being more easily transferred from the lowest WF material, Ti, compared to the highest WF material, Pt. However, the magnitudes of the doping efficiency do not vary linearly with the WF of the TM. 

26 Specifically, in Ref. 26, the scattering per impurity does not scale linearly with the impurity charge and instead has a strong quadratic component, resulting in scattering that scales as2nimp= nimp VD,shift . 

An interfacial dipole whose strength decreases with increasing equilibrium spacing deq Ref. 8 provides a possible explanation for the nonmonotonic behavior of the Dirac point shift in Pt samples. 

For low coverage, the room-temperature deposition of TM leads to clustering as shown in the atomic force microscope AFM image of 0.01 ML 

Due to the presence of the material-dependent factor i.e., doping efficiency , the mobility vs Dirac point shift curves should be significantly different for different materials. 

The average mobility, = e+ h /2, is plotted for Ti and Pt. The Fe samples typically exhibit a reduction in hole mobility which is most pronounced in sample Fe-2, so e and h are plotted separately. 

Because the Dirac point shift not only measures the doping level in the graphene but also the average charge density of the TM, the data shows that the scattering is related to the average charge density of the clusters—a characteristic, that is, plausible for Coulomb scattering.