Enabling nanotechnology with self assembled block copolymer patterns
TLDR
In this paper, a review of the current efforts to utilize block copolymers in nanotechnologies including nanostructured membranes, BCP templates for nanoparticle synthesis, photonic crystals, and high-density information storage media is presented.About:
This article is published in Polymer.The article was published on 2003-10-01 and is currently open access. It has received 1466 citations till now.read more
Citations
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Organic solar cells: An overview
TL;DR: The current status of the field of organic solar cells and the important parameters to improve their performance are discussed in this paper. But, the two competitive production techniques used today are either wet solution processing or dry thermal evaporation of the organic constituents.
Journal ArticleDOI
Advanced functional polymer membranes
TL;DR: A comprehensive overview on the development of polymeric membranes having advanced or novel functions in the various membrane sepn processes for liq. and gaseous mixts can be found in this paper.
Journal ArticleDOI
Self-Assembled Nanoreactors
Dennis M. Vriezema,Marta Comellas Aragones,Johannes A. A. W. Elemans,Jeroen J. L. M. Cornelissen,Alan E. Rowan,Roeland J. M. Nolte +5 more
TL;DR: An overview of the wide range of nanoreactors that have been constructed from synthetic and biological building blocks using both covalent and noncovalent approaches is given, starting from small organic molecular containers expanding to large compartment-containing assemblies.
PatentDOI
Density multiplication and improved lithography by directed block copolymer assembly
Paul F. Nealey,Huiman Kang,François Detcheverry,Juan J. Depablo,Ricardo Ruiz,Thomas R. Albrecht +5 more
TL;DR: In this article, a method to pattern a substrate with dense periodic nanostructures that combine top-down lithographic tools and self-assembling block copolymer materials is described.
Journal ArticleDOI
A Survey of Control Issues in Nanopositioning
TL;DR: This paper presents an overview of nanopositioning technologies and devices emphasizing the key role of advanced control techniques in improving precision, accuracy, and speed of operation of these systems.
References
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Triblock copolymer syntheses of mesoporous silica with periodic 50 to 300 angstrom pores
Dongyuan Zhao,Jianglin Feng,Qisheng Huo,Nicholas A. Melosh,Glenn H. Fredrickson,Bradley F. Chmelka,Galen D. Stucky +6 more
TL;DR: Use of amphiphilic triblock copolymers to direct the organization of polymerizing silica species has resulted in the preparation of well-ordered hexagonal mesoporous silica structures (SBA-15) with uniform pore sizes up to approximately 300 angstroms.
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"Dip-Pen" Nanolithography
TL;DR: A direct-write "dip-pen" nanolithography (DPN) has been developed to deliver collections of molecules in a positive printing mode, making DPN a potentially useful tool for creating and functionalizing nanoscale devices.
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Block Copolymers—Designer Soft Materials
TL;DR: The Knitting Pattern as mentioned in this paper is a block copolymer that was discovered by Reimund Stadler and his coworkers and reflects a delicate free-energy minimization that is common to all blockcopolymer materials.
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Imprint Lithography with 25-Nanometer Resolution
TL;DR: In this paper, a high-throughput lithographic method with 25-nanometer resolution and smooth vertical sidewalls is proposed and demonstrated, which uses compression molding to create a thickness contrast pattern in a thin resist film carried on a substrate, followed by anisotropic etching to transfer the pattern through the entire resist thickness.
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Ultrahigh-Density Nanowire Arrays Grown in Self-Assembled Diblock Copolymer Templates
Thomas Thurn-Albrecht,Joerg Schotter,G. A. Kästle,N. Emley,Takasada Shibauchi,Takasada Shibauchi,Lia Krusin-Elbaum,Kathryn W. Guarini,Charles T. Black,Mark T. Tuominen,Thomas P. Russell +10 more
TL;DR: A simple, robust, chemical route to the fabrication of ultrahigh-density arrays of nanopores with high aspect ratios using the equilibrium self-assembled morphology of asymmetric diblock copolymers is shown.