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Morphological and microstructural characterization of nanostructured pure α-phase W coatings on a wide thickness range

TLDR
In this paper, the influence of the sputtering power on the adhesion of the coatings to the substrate was investigated by depositing coatings at powers varying from 30 up to 220 W.
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This article is published in Applied Surface Science.The article was published on 2014-10-15 and is currently open access. It has received 33 citations till now. The article focuses on the topics: Coating & Sputter deposition.

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Citations
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Influence of grain boundaries on the radiation-induced defects and hydrogen in nanostructured and coarse-grained tungsten

TL;DR: In this paper, the influence of grain boundaries (GBs) on the radiation-induced defect evolution and on H retention at 300 K, both experimentally and by computer simulations, was studied.
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Hydrogen diffusion and trapping in nanocrystalline tungsten

TL;DR: In this article, the hydrogen behavior in nanocrystalline W (ncW) samples with grain size of 5 and 10nm was studied using Molecular Dynamics (MD) with a bond order potential (BOP) for the W-H system.
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The influence of high grain boundary density on helium retention in tungsten

TL;DR: In this paper, the influence of a high grain boundary density on the amount, size and distribution of defects produced by pulsed helium (625 keV) irradiation in tungsten has been studied.
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Metal-semiconductor oxide (WO3@W) induces an efficient electro–photo synergistic catalysis for MOR and ORR

TL;DR: In this article, the oxide-derived metal nanostructures (M-MOx) were used to construct WO3@W in situ to ensure the close contact at the interface between W and WO 3, resulting in the unique two contact modes (Ohmic contact between X and Y and Schottky contact between Pt and X) in Pt-WO3-@W/graphene (simplified as PtwO3/W/GNs).
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Hydrogen accumulation in nanostructured as compared to the coarse-grained tungsten

TL;DR: In this paper, the influence of sample microstructure and of irradiation conditions on the H behavior in Tungsten (W) was investigated, where commercial coarse grained (CGW) and nanostructured W (NW) samples were implanted with (i) H at room temperature (RT), (ii) C and H at RT, and (iii) simultaneously (co-implanted) with H and C at RT.
References
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Journal ArticleDOI

Status of Plasma Facing Material Studies and Issues toward DEMO

TL;DR: In this article, the status of research activity of plasma facing materials, mostly tungsten and critical issues towards DEMO reactors are discussed, including effects of steady-state operation and heavy neutron irradiation.
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Low-stress W/Cr films for SCALPEL® mask scattering layers

TL;DR: In this paper, the authors describe the development of low-stress W/Cr bilayer films, for use as SCALPEL® mask scattering layers, which are produced by dc magnetron sputtering in argon, and consist of 25-50-nm-thick W layers deposited onto 5-10-nthick Cr layers.
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Surface hardening of tungsten heavy alloys

TL;DR: In this paper, a relatively simple method was used for modification of heavy alloy surfaces, which involved conversion of W to WC in a flowing CH{sub 4 + Ar gas atmosphere without the aid of plasma.
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Effectiveness and Reliability of Metal Diffusion Barriers for Copper Interconnects

TL;DR: In this article, the median-time-to-failure (MTTF) of a polycrystalline barrier (30 nm) has been measured at different bias electrical fields and stressing temperatures, and the extrapolated MTTF of such a barrier is > 100 year at an operating condition of 200C and 0.1 MV/cm.
Journal Article

Thermoionic vacuum arc (TVA) deposited tungsten thin film characterization

TL;DR: In this article, the authors presented the characterization of the tungsten thin films deposited by TVA method and characterized the nano-indentation and atomic force microscopy (AFM) measurements.
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In a previous work this paper, the authors have presented an overview of the relationship between the safety and Durability of Structures and Materials ( CISDEM ), UPM-CSIC, IMM-CNM, and Isaac Newton 8 PTM.