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Open AccessJournal ArticleDOI

On tilt and curvature dependent errors and the calibration of coherence scanning interferometry

TLDR
It is shown that by calibrating the instrument correctly and using appropriate methods to extract phase from the resulting fringes (such as frequency domain analysis), CSI is capable of measuring the topography of surfaces with varying tilt with sub-nanometre accuracy.
Abstract
Although coherence scanning interferometry (CSI) is capable of measuring surface topography with sub-nanometre precision, it is well known that the performance of measuring instruments depends strongly on the local tilt and curvature of the sample surface. Based on 3D linear systems theory, however, a recent analysis of fringe generation in CSI provides a method to characterize the performance of surface measuring instruments and offers considerable insight into the origins of these errors. Furthermore, from the measurement of a precision sphere, a process to calibrate and partially correct instruments has been proposed. This paper presents, for the first time, a critical look at the calibration and correction process. Computational techniques are used to investigate the effects of radius error and measurement noise introduced during the calibration process for the measurement of spherical and sinusoidal profiles. Care is taken to illustrate the residual tilt and curvature dependent errors in a manner that will allow users to estimate measurement uncertainty. It is shown that by calibrating the instrument correctly and using appropriate methods to extract phase from the resulting fringes (such as frequency domain analysis), CSI is capable of measuring the topography of surfaces with varying tilt with sub-nanometre accuracy.

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Citations
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Journal ArticleDOI

Optimization of surface measurement for metal additive manufacturing using coherence scanning interferometry

TL;DR: In this paper, the authors present an experimental investigation of the use of coherence scanning interferometry (CSI) for measurement of AM surfaces, including high dynamic range for light level and adjustable data acquisition rates for noise reduction.
Journal ArticleDOI

A review of selected topics in interferometric optical metrology

TL;DR: This review gathers together 15 special topics in modern interferometric metrology representing a sampling of historical, current and future developments, covering a wide range of applications, including distance and displacement measurement, the testing of optical components, interference microscopy for surface structure analysis, form and dimensional measurements of industrial parts.
Journal ArticleDOI

Dimensional artefacts to achieve metrological traceability in advanced manufacturing

TL;DR: Dimensional artefacts are examined, discussing their characteristics, availability and role in supporting production by establishing metrological traceability, and guidelines for their selection, use and development are provided.
Journal ArticleDOI

Designing indices to measure surface roughness based on the color distribution statistical matrix (CDSM)

TL;DR: A color image-based indices design and evaluation method that can quantitatively and comprehensively characterize the performance of different indices is proposed and designed.
Journal ArticleDOI

Crystallographic texture can be rapidly determined by electrochemical surface analytics

TL;DR: In this paper, the electrochemical jet processing (EJP) was applied to polycrystalline Al and Ni surfaces to generate three-colour orientation contrast maps, and the resulting surfaces were analyzed to generate 3D contrast maps.
References
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Advances in engineered surfaces for functional performance

TL;DR: In this article, the authors report the advances in the state of the art considering the relationships between the properties of functional surfaces, their applications and the technologies to engineer surfaces, and their applications in many advanced fields, such as: electronics, information technology, energy, optics, tribology, biology and biomimetics.
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Efficient nonlinear algorithm for envelope detection in white light interferometry

TL;DR: The new algorithm is shown to be near optimal in terms of computational efficiency and can be represented as a second-order nonlinear filter and in combination with a carefully designed peak detection method the algorithm exhibits exceptionally good performance on simulated interferograms.
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Dimensional micro and nano metrology

TL;DR: The need for dimensional micro and nano metrology is evident, and as critical dimensions are scaled down and geometrical complexity of objects is increased, the available technologies appear not sufficient as mentioned in this paper.
Journal ArticleDOI

Principles of interference microscopy for the measurement of surface topography

TL;DR: Recent advances considered here include performance improvements, vibration robustness, full color imaging, accommodation of highly sloped surfaces, correlation to contact methods, transparent film analysis, and international standardization of calibration and specification.
Journal ArticleDOI

Determination of fringe order in white-light interference microscopy

TL;DR: The algorithm adapts to surface texture and noise level and dynamically compensates for optical aberrations, distortions, diffraction, and dispersion that would otherwise lead to incorrect fringe order.
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