Journal ArticleDOI
Optical reflectivity of micromachined {111}-oriented silicon mirrors for optical input - output couplers
Reads0
Chats0
TLDR
In this paper, the authors describe the silicon mirror processing conditions, measured reflectivities, reflected beam profiles, and a prototype integrated optical I-O coupler with the realized mirrors, enabling them to envisage a synchronized optical clock distribution system as well as a distributed remote optical sensing system with low manufacturing cost.Abstract:
In this work, bulk-micromachined -oriented silicon mirrors at have been fabricated in 20 wt% KOH solution at various temperatures and characterized with single-mode fibers (10/125 and 5/125). In fabricating the mirrors, the etch rate of the (100) silicon surface was widely varied from 5.3 to as the processing temperatures were varied from 40 to C. In spite of the tremendous variation of etch rate, the measured reflectivities of the mirrors showed fairly stable values of 63.7 - 58% at 1330 nm and 55.4 - 57.7% at 1550 nm. This paper describes the silicon mirror processing conditions, measured reflectivities, reflected beam profiles, and a prototype integrated optical I - O coupler with the realized mirrors. The results obtained from this work show that optical I - O couplers with mirrors on conventional (100)-oriented silicon wafers are feasible, enabling us to envisage a synchronized optical clock distribution system as well as a distributed remote optical sensing system with low manufacturing cost.read more
Citations
More filters
Book
Integrated Interconnect Technologies for 3D Nanoelectronic Systems
TL;DR: In this article, the authors present a broad overview of the latest advances in high-density compliant electrical interconnects, nanophotonics, and microfluidics for 3D GSI/TSI realization.
Journal ArticleDOI
The role of Triton surfactant in anisotropic etching of {1 1 0} reflective planes on (1 0 0) silicon
TL;DR: In this paper, Triton-x-100 surfactant was used as an additive to 25% TMAH in anisotropic etching of {1 1 0} silicon passive mirror planes.
Journal ArticleDOI
Optical proximity communication using reflective mirrors.
Xuezhe Zheng,John E. Cunningham,Ivan Shubin,John Simons,Mehdi Asghari,Dazeng Feng,Hongbin Lei,Dawei Zheng,Hong Liang,Cheng-Chih Kung,Jonathan Luff,T. Sze,Danny Cohen,Ashok V. Krishnamoorthy +13 more
TL;DR: With wavelength division multiplexing (WDM) enabled OPxC, very high bandwidth density I/O, orders of magnitude higher than the traditional electrical I/W, can be achieved for silicon chips.
Journal ArticleDOI
Optical Proximity Communication With Passively Aligned Silicon Photonic Chips
A.V. Krishnamoorthy,John E. Cunningham,Xuezhe Zheng,I. Shubin,John Simons,Dazeng Feng,Hong Liang,Cheng-Chih Kung,M. Asghari +8 more
TL;DR: In this paper, a high-fidelity 10-Gb/s optical-proximity communication using reflecting mirrors micro-machined into silicon and co-integrated with low-loss silicon-on-insulator waveguides for packaged chip-to-chip communication is reported.
Journal ArticleDOI
Impact of alcohol additives concentration on etch rate and surface morphology of (100) and (110) Si substrates etched in KOH solutions
Krzysztof P. Rola,Irena Zubel +1 more
TL;DR: In this paper, the influence of alcohol concentration on etch rate and surface morphology of (100) and (110) Si planes was investigated and the etching processes were carried out in KOH solutions with different concentrations of isopropanol and butanols.
References
More filters
Journal ArticleDOI
Silicon as a mechanical material
TL;DR: This review describes the advantages of employing silicon as a mechanical material, the relevant mechanical characteristics of silicon, and the processing techniques which are specific to micromechanical structures.
Journal Article
Silicon as a mechanical material
TL;DR: In this article, the advantages of employing silicon as a mechanical material, the relevant mechanical characteristics of silicon, and the processing techniques which are specific to micromechanical structures are discussed.
Journal ArticleDOI
Anisotropic Etching of Crystalline Silicon in Alkaline Solutions I . Orientation Dependence and Behavior of Passivation Layers
TL;DR: In this article, the anisotropic etching behavior of single-crystal silicon and the behavior of and in an ethylenediamine-based solution as well as in aqueous,, and were studied.
Proceedings ArticleDOI
A Bi-Directional Magnetic Micropump on a Silicon Wafer
W. Zhang,Chong H. Ahn +1 more
Proceedings ArticleDOI
Wet chemical etching mechanism of silicon
TL;DR: In this paper, the authors review what can be said on wet chemical etching of single crystals from the viewpoint of crystal growth and explain the minimum of the etch rate in KOH:H/sub 2/O in the direction.