Journal ArticleDOI
Simple rules for the understanding of Heusler compounds
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TLDR
Heusler compounds as discussed by the authors are a remarkable class of intermetallic materials with 1:1:1 or 2:1-1 composition comprising more than 1500 members, and their properties can easily be predicted by the valence electron count.About:
This article is published in Progress in Solid State Chemistry.The article was published on 2011-05-01. It has received 1675 citations till now. The article focuses on the topics: Heusler compound.read more
Citations
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The high-throughput highway to computational materials design
Stefano Curtarolo,Gus L. W. Hart,Gus L. W. Hart,Marco Buongiorno Nardelli,Marco Buongiorno Nardelli,Marco Buongiorno Nardelli,Natalio Mingo,Stefano Sanvito,Stefano Sanvito,Ohad Levy +9 more
TL;DR: A current snapshot of high-throughput computational materials design is provided, and the challenges and opportunities that lie ahead are highlighted.
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Topological Materials: Weyl Semimetals
Binghai Yan,Claudia Felser +1 more
TL;DR: In this paper, the authors review the basic concepts and compare these topological states of matter from the materials perspective with a special focus on Weyl semimetals, and introduce the signatures of Weyl points in a pedagogical way, from Fermi arcs to the chiral magnetotransport properties.
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Pseudopotentials for high-throughput DFT calculations
TL;DR: In this article, the authors present design criteria and testing results for a new open-source "GBRV" ultrasoft pseudopotential library that has been optimized for use in high-throughput DFT calculations.
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Magnetocaloric effect: From materials research to refrigeration devices
TL;DR: The magnetocaloric effect and its most straightforward application, magnetic refrigeration, are topics of current interest due to the potential improvement of energy efficiency of cooling and temperature control systems, in combination with other environmental benefits associated to a technology that does not rely on the compression/expansion of harmful gases.
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Realizing high figure of merit in heavy-band p-type half-Heusler thermoelectric materials.
TL;DR: A high zT of ∼1.5 at 1,200 K is reported for the p-type FeNbSb heavy-band half-Heusler alloys with enhanced point-defect and electron–phonon scatterings and a significant reduction in the lattice thermal conductivity, highlighting the optimization strategy forheavy-band thermoelectric materials.
References
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A Simple Model of a Single-Electron Floating Dot Memory for Circuit Simulation
TL;DR: In this article, a new simulation technique for a single-electron floating-dot memory based on a semiclassical singleelectron transistor is proposed, which is designed to be suitable for use in circuit simulation and it uses a Monte Carlo method in combination with the master equation.
Journal ArticleDOI
The crystallization of amorphous Fe2MnGe powder prepared by ball milling
TL;DR: In this article, the first time the intermetallic compound Fe2MnGe was synthesized by using planetary ball milling elemental starting materials, and the amorphous-to-crystalline transition was studied by means of differential scanning calorimetry and X-ray diffraction (XRD).
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XAFS Study on Nitrogenation of CoTiSn
TL;DR: In this article, the gas-phase nitrogenation of CoTiSn compound with the MgAgAs-type structure has been examined by means of x-ray diffraction (XRD) and X-ray absorption fine structure (XAFS), which suggests that the nitrogenation product is composed of the corresponding Cu2MnAl-type compound with expanded unitcell volume comparable to that of Co2TiSn and subtle trace of Ti6Sn5 and Sn.
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Hyperfine fields in a new Heusler alloy Mn2CoSn
TL;DR: A new Heusler alloy Mn2CoSn has been obtained in this article, where the distribution of hyperfine fields in Mn2coSn and Mn2cSn alloys by nuclear spin echo method has been investigated.
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Finding interstitial oxygen in an Si substrate during low-temperature plasma oxidation
TL;DR: In this paper, an inductively coupled plasma oxidation using O2 gas and N2O gas was performed by atomic oxygen, not by molecular oxygen, indicating that atomic oxygen in plasma is responsible for the incorporation of interstitial oxygen.
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