D
Dong Myong Kim
Researcher at Kookmin University
Publications - 233
Citations - 4036
Dong Myong Kim is an academic researcher from Kookmin University. The author has contributed to research in topics: Thin-film transistor & Threshold voltage. The author has an hindex of 25, co-authored 216 publications receiving 3378 citations.
Papers
More filters
Journal ArticleDOI
One Transistor–Two Memristor Based on Amorphous Indium–Gallium–Zinc-Oxide for Neuromorphic Synaptic Devices
TL;DR: In this paper, various memristor-based synaptic devices have been proposed for implementing a neuromorphic system, but they typically suffer from various inherent problems such as nonlinearity a...
Journal ArticleDOI
Distribution of Interface States in MOS Systems Extracted by the Subthreshold Current in MOSFETs under Optical Illumination
Minseon Kim,Hyungtak Kim,Sung-Soo Chi,T. E. Kim,H. T. Shin,K. W. Kang,H.S. Park,Dongjo Kim,Kyeong-Sik Min,D. W. Kang,Dong Myong Kim +10 more
TL;DR: Based on the photonic highfrequency capacitance-voltage response of MOS capacitors and the conventional sub-threshold current method, an improved characterization method is reported for the analysis of interface-states in MOS systems in this article.
Journal ArticleDOI
A Novel Self-Aligned 4-Bit SONOS-Type Nonvolatile Memory Cell With T-Gate and I-Shaped FinFET Structure
TL;DR: It is confirmed by 2-D technology computer-aided design simulation that the proposed NVM cell with channel length L = 50 nm operates with enough sensing margin and high-density NVM by the crossed cell array architecture.
Journal ArticleDOI
Characterization of density-of-states and parasitic resistance in a-InGaZnO thin-film transistors after negative bias stress
Chunhyung Jo,Sungwoo Jun,Woojoon Kim,Inseok Hur,Hagyoul Bae,Sung-Jin Choi,Dae Hwan Kim,Dong Myong Kim +7 more
TL;DR: In this paper, the authors investigated the instability mechanism of amorphous InGaZnO thin-film transistors under negative bias stress (NBS) and found that the dominant mechanism of NBS-induced instability was not a change in the subgap density-of-states (DOS), but a reduction in the parasitic resistance caused by reduced Schottky barrier of the metal contacts.
Journal ArticleDOI
Total Subgap Range Density of States-Based Analysis of the Effect of Oxygen Flow Rate on the Bias Stress Instabilities in a-IGZO TFTs
Gang Yang,Jingyu Park,Sungju Choi,Changwook Kim,Dong Myong Kim,Sung-Jin Choi,Jong-Ho Bae,Il Hwan Cho,Dae Hwan Kim +8 more
TL;DR: In this article , negative bias illumination stress (NBIS) and positive bias stress (PBS) in amorphous indium-gallium-zincoxide (a-IGZO) thin-film transistor (TFT) devices were investigated.