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Dong Myong Kim

Researcher at Kookmin University

Publications -  233
Citations -  4036

Dong Myong Kim is an academic researcher from Kookmin University. The author has contributed to research in topics: Thin-film transistor & Threshold voltage. The author has an hindex of 25, co-authored 216 publications receiving 3378 citations.

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One Transistor–Two Memristor Based on Amorphous Indium–Gallium–Zinc-Oxide for Neuromorphic Synaptic Devices

TL;DR: In this paper, various memristor-based synaptic devices have been proposed for implementing a neuromorphic system, but they typically suffer from various inherent problems such as nonlinearity a...
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Distribution of Interface States in MOS Systems Extracted by the Subthreshold Current in MOSFETs under Optical Illumination

TL;DR: Based on the photonic highfrequency capacitance-voltage response of MOS capacitors and the conventional sub-threshold current method, an improved characterization method is reported for the analysis of interface-states in MOS systems in this article.
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A Novel Self-Aligned 4-Bit SONOS-Type Nonvolatile Memory Cell With T-Gate and I-Shaped FinFET Structure

TL;DR: It is confirmed by 2-D technology computer-aided design simulation that the proposed NVM cell with channel length L = 50 nm operates with enough sensing margin and high-density NVM by the crossed cell array architecture.
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Characterization of density-of-states and parasitic resistance in a-InGaZnO thin-film transistors after negative bias stress

TL;DR: In this paper, the authors investigated the instability mechanism of amorphous InGaZnO thin-film transistors under negative bias stress (NBS) and found that the dominant mechanism of NBS-induced instability was not a change in the subgap density-of-states (DOS), but a reduction in the parasitic resistance caused by reduced Schottky barrier of the metal contacts.
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Total Subgap Range Density of States-Based Analysis of the Effect of Oxygen Flow Rate on the Bias Stress Instabilities in a-IGZO TFTs

TL;DR: In this article , negative bias illumination stress (NBIS) and positive bias stress (PBS) in amorphous indium-gallium-zincoxide (a-IGZO) thin-film transistor (TFT) devices were investigated.