Catalytic activity of noble metals for metal-assisted chemical etching of silicon
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TLDR
The influence of noble metal particles, silver, gold, platinum, and rhodium, on this etching is investigated under dark conditions: the absence of photogenerated charges in the silicon.Abstract:
Metal-assisted chemical etching of silicon is an electroless method that can produce porous silicon by immersing metal-modified silicon in a hydrofluoric acid solution without electrical bias. We have been studying the metal-assisted hydrofluoric acid etching of silicon using dissolved oxygen as an oxidizing agent. Three major factors control the etching reaction and the porous silicon structure: photoillumination during etching, oxidizing agents, and metal particles. In this study, the influence of noble metal particles, silver, gold, platinum, and rhodium, on this etching is investigated under dark conditions: the absence of photogenerated charges in the silicon. The silicon dissolution is localized under the particles, and nanopores are formed whose diameters resemble the size of the metal nanoparticles. The etching rate of the silicon and the catalytic activity of the metals for the cathodic reduction of oxygen in the hydrofluoric acid solution increase in the order of silver, gold, platinum, and rhodium.read more
Citations
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Journal ArticleDOI
Schottky Barrier Catalysis Mechanism in Metal-Assisted Chemical Etching of Silicon.
TL;DR: It is proposed that the Schottky junction formed between metal and silicon plays an essential role on the distribution of holes in silicon injected from hydrogen peroxide.
Journal ArticleDOI
Nanostructured silicon via metal assisted catalyzed etch (MACE): chemistry fundamentals and pattern engineering.
Fatima Toor,Jeff Miller,Lauren M. Davidson,Logan Nichols,Wenqi Duan,Michael Jura,Joanne Yim,Joanne Forziati,Marcie R. Black +8 more
TL;DR: The chemistry of MACE is reviewed and how changing parameters in the wet etch process effects the resulting texture on the Si surface is explored, which is critical for commercializing the black Si technology.
Journal ArticleDOI
A MACEing Silicon: Towards single-step etching of defined porous nanostructures for biomedicine
Hashim Alhmoud,Hashim Alhmoud,D. Brodoceanu,D. Brodoceanu,Roey Elnathan,Roey Elnathan,Roey Elnathan,Tobias Kraus,Tobias Kraus,Nicolas H. Voelcker +9 more
TL;DR: A comprehensive overview of the metal-assisted chemical etching (MACE) reaction mechanism that yields biomedically relevant silicon nanostructures can be found in this article, where they discuss their biomedical applications in biosensors, cell capture and transfection arrays, and drug delivery vectors.
Patent
Nanoshape patterning techniques that allow high-speed and low-cost fabrication of nanoshape structures
Sidlgata V. Sreenivasan,Anshuman Cherala,Meghali C. Chopra,Roger T. Bonnecaze,Ovadia Abed,Bailey Yin,Akhila Mallavarapu,Shrawan Singhal,Brian Gawlik +8 more
TL;DR: In this article, a resist imprint of the nanoscale sharp shapes is performed using J-FIL and the shape is etched into underlying functional films on the substrate forming a nansohaped template with sharp corners and/or ultra-small gaps.
Journal ArticleDOI
Metal assisted chemical etching of silicon in the gas phase: a nanofabrication platform for X-ray optics
Lucia Romano,Lucia Romano,Lucia Romano,Matias Kagias,Joan Vila-Comamala,Joan Vila-Comamala,Konstantins Jefimovs,Konstantins Jefimovs,Li-Ting Tseng,Vitaliy A. Guzenko,Marco Stampanoni,Marco Stampanoni +11 more
TL;DR: This work demonstrates the fabrication of structures with ultra-high aspect ratios in the nanoscale regime by platinum assisted chemical etching of silicon in the gas phase and opens the possibility of a low cost etching method for stiction-sensitive nanostructures and a large range of applications where silicon high aspect ratio nanostructure and high precision of pattern transfer are required.
References
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TL;DR: Standard Potentials in Aqueous solution as mentioned in this paper is a collection of thermodynamic data from the IUPAC Commissions onElectrochemistry and Electroanalytical Chemistry, and it is a valuable supplementarytext for undergraduate and graduate-level chemistry students.
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Metal-assisted chemical etching in HF/H2O2 produces porous silicon
Xiuling Li,Paul W. Bohn +1 more
TL;DR: In this paper, a simple and effective method is presented for producing light-emitting porous silicon (PSi) using a thin layer of Au, Pt, or Au/Pd is deposited on the (100) Si surface prior to immersion in a solution of HF and H2O2 depending on the type of metal deposited and Si doping type and doping level.
Journal ArticleDOI
Metal-assisted chemical etching of silicon in HF–H2O2
TL;DR: In this paper, metal-assisted etching of silicon in HF/H2O2//H 2O solutions with Ag nanoparticles as catalyst agents was investigated, and the dissolution mechanisms were discussed on the basis of a localized hole injection from the Ag particles into Si and in terms of the well known chemistry of Si dissolution in HF-based chemical and electrochemical systems.
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TL;DR: In this paper, the basic theory of Semiconductor Electrochemistry is discussed. And the following properties of Silicon/Electrolyte interfaces are discussed: 1.1. Potential and charge distribution in Space Charge Layer. 2.2.