Journal ArticleDOI
Correlation between the microstructure and electroluminescence properties of Er-doped metal-oxide semiconductor structures
TLDR
In this article, the authors investigated the effect of rare earth (RE)-doped SiO2 layer on the luminescence properties of metal-oxide-semiconductor structures.Abstract:
Optical response of a rare earth (RE)-doped SiO2 layer is known to deteriorate markedly at room temperature due to RE clustering. The key challenge is therefore to probe the ongoing processes at the microscopic level and the subsequent impact on the luminescence properties with increasing RE concentration. Here, we report how the Er electroluminescence in a metal-oxide-semiconductor structure has been affected by increasing Er content. Our results indicate that the Er oxide clustering is anticipated by the formation of Si-based oxygen-deficiency centers during postimplantation annealing and leads to a strong quenching of the short-wavelength (350–500 nm) Er electroluminescence.read more
Citations
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Journal ArticleDOI
Electroluminescence from Er-doped Si-rich silicon nitride light emitting diodes
Selcuk Yerci,Rui Li,L. Dal Negro +2 more
TL;DR: The electrical transport mechanism in these devices was investigated and the excitation cross section for the 1535 nm Er emission was measured under electrical pumping, resulting in a value (1.2×10−15 cm2) comparable to optical pumping as mentioned in this paper.
Journal ArticleDOI
Recent Progress in Silicon Photonics: A Review
Zhou Fang,Cezhou Zhao +1 more
TL;DR: An overview of the progress and the state of the art of each component in silicon photonics, including waveguides, filters, modulators, detectors, and lasers, mainly in the last five years is provided.
Journal ArticleDOI
Effect of grain-boundaries on electrical properties of n-ZnO:Al/p-Si heterojunction diodes
TL;DR: In this paper, the authors report on room temperature diode characteristics of ZnO:Al (AZO)/Si heterostructures by current-voltage measurements and show that with increasing AZO film thickness, systematic reduction in the turn-on potential (from 3.16 to 1.80 V) and film stress are observed.
Journal ArticleDOI
Low-voltage driven ∼1.54 μm electroluminescence from erbium-doped ZnO/p+-Si heterostructured devices: Energy transfer from ZnO host to erbium ions
TL;DR: In this paper, it is shown that the Er-related electroluminescence at ∼ 1.54μm can be enabled at a voltage as low as 6μm by transferring the energy released from the defect-assisted indirect recombination in the ZnO host to the incorporated Er3+ ions.
Journal ArticleDOI
Erbium emission in MOS light emitting devices: from energy transfer to direct impact excitation
Joan Manel Ramirez,Federico Ferrarese Lupi,Olivier Jambois,Yonder Berencén,Daniel Navarro-Urrios,Daniel Navarro-Urrios,Aleksei Anopchenko,A. Marconi,N. Prtljaga,A. Tengattini,Lorenzo Pavesi,J. P. Colonna,J-M. Fedeli,B. Garrido +13 more
TL;DR: It is demonstrated that sequential electron and hole injection at the edges of the pulses creates excited states in Si-ncs which upon recombination transfer their energy to Er3C ions, which dominates for high-field APV excitation.
References
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Book
CRC Handbook of Chemistry and Physics
TL;DR: CRC handbook of chemistry and physics, CRC Handbook of Chemistry and Physics, CRC handbook as discussed by the authors, CRC Handbook for Chemistry and Physiology, CRC Handbook for Physics,
Journal ArticleDOI
Stretched-exponential decay of the luminescence in porous silicon.
Lorenzo Pavesi,M. Ceschini +1 more
TL;DR: An experimental study of the luminescence time decay in porous silicon as a function of temperature, excitation, and observation energies is reported.
Journal ArticleDOI
Strong blue and violet photoluminescence and electroluminescence from germanium-implanted and silicon-implanted silicon-dioxide layers
Lars Rebohle,J. von Borany,Rossen Yankov,Wolfgang Skorupa,Ida E. Tyschenko,Hartmut Fröb,Karl Leo +6 more
TL;DR: In this paper, the photoluminescence (PL) and electroluminecence (EL) properties of Ge-implanted SiO2 layers thermally grown on a Si substrate were investigated and compared to those of Si-implants O2 films.