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Journal ArticleDOI

Increased photoluminescence of strain-reduced, high-Sn composition Ge1−xSnx alloys grown by molecular beam epitaxy

TLDR
In this paper, the authors synthesize up to Ge0.914Sn0.086 alloys on (100) GaAs/InyGa1−yAs buffer layers using molecular beam epitaxy.
Abstract
We synthesized up to Ge0.914Sn0.086 alloys on (100) GaAs/InyGa1−yAs buffer layers using molecular beam epitaxy. The buffer layers enable engineered control of strain in the Ge1−xSnx layers to reduce strain-related defects and precipitation. Samples grown under similar conditions show a monotonic increase in the integrated photoluminescence (PL) intensity as the Sn composition is increased, indicating changes in the bandstructure favorable for optoelectronics. We account for bandgap changes from strain and composition to determine a direct bandgap bowing parameter of b = 2.1 ± 0.1. According to our models, these are the first Ge1−xSnx samples that are both direct-bandgap and exhibit PL.

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Citations
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Journal ArticleDOI

Lasing in direct-bandgap GeSn alloy grown on Si

TL;DR: In this paper, a direct bandgap GeSn alloy, grown directly onto Si(001), was used for experimentally demonstrating lasing threshold and linewidth narrowing at low temperatures.
Journal ArticleDOI

On-chip light sources for silicon photonics

TL;DR: Zhou et al. as discussed by the authors assess the three main contenders for on-chip light sources: erbium-based light sources, germanium-on-silicon lasers and III-V-based silicon lasers.
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Achieving direct band gap in germanium through integration of Sn alloying and external strain

TL;DR: In this paper, a theoretical model was developed based on the nonlocal empirical pseudopotential method to determine the electronic band structure of germanium tin (GeSn) alloys, and modifications to the virtual crystal potential accounting for disorder induced potential fluctuations were incorporated to reproduce the large direct band gap bowing observed in GeSn alloys.
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Electronic band structure and effective mass parameters of Ge1-xSnx alloys

TL;DR: In this article, the electronic band structures of bulk Ge1-xSnx alloys were investigated using the empirical pseudopotential method (EPM) for Sn composition x varying from 0 to 0.2.
Journal ArticleDOI

Si–Ge–Sn alloys: From growth to applications

TL;DR: In this paper, the transition from an indirect to a fundamental direct bandgap material will be discussed, and the most commonly used approaches, i.e., molecular beam epitaxy (MBE) and chemical vapor deposition (CVD), will be reviewed in terms of crucial process parameters, structural as well as optical quality and employed precursor combinations including Germanium hydrides, Silicon hydride and a variety of Sn compounds like SnD4, SnCl4 or C6H5SnD3.
References
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Journal ArticleDOI

Interband Transitions in Sn x Ge 1-x Alloys

TL;DR: Optical absorption measurements for diamond cubic cubic alloy films indicate strong interband transitions with a change in direct energy gap of $0.35l{E}_{g}l0.80\mathrm{eV}$ for $ 0.15gxg0$.
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Optical critical points of thin-film Ge 1-y Sn y alloys: A comparative Ge 1-y Sn y /Ge 1-x Si x study

TL;DR: In this paper, a scaling behavior for the electronic properties that is the analog of the scaling behavior found earlier for the vibrational properties was found for the optical transitions in the alloys, which is not predicted by electronic structure calculations within the virtual crystal approximation.
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Direct-gap photoluminescence with tunable emission wavelength in Ge1−ySny alloys on silicon

TL;DR: In this paper, direct-gap photoluminescence has been observed at room temperature in Ge1−ySny alloys grown on (001) Si substrates.
Journal ArticleDOI

Origin of the unusually large band-gap bowing and the breakdown of the band-edge distribution rule in the Sn x Ge 1-x alloys

TL;DR: In this paper, the unusual nonlinear behaviors of the band gaps in alloys are investigated using first-principles calculations, and it is shown that the large bowing of the direct band gap is induced by the disordering effect.
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Strong enhancement of direct transition photoluminescence with highly tensile-strained Ge grown by molecular beam epitaxy

TL;DR: In this article, high tensile-strained layers of Ge were grown via molecular beam epitaxy using step-graded InxGa1−xAs buffer layers on (100) GaAs.
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