Journal ArticleDOI
Microfocused ion beam applications in microelectronics
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TLDR
In this paper, focused ion beams have been applied to III-V materials for in situ processing, lithography, and fabrication of integrated optics devices by micromachining, with a focus on the application of defect repair for photomasks.About:
This article is published in Applied Surface Science.The article was published on 1989-01-01. It has received 22 citations till now. The article focuses on the topics: Focused ion beam & Ion beam.read more
Citations
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Journal ArticleDOI
High‐resolution focused ion beams
TL;DR: In this article, it was demonstrated that sub-micrometer focused ion beams can be produced with current densities greater than 1 A ǫ cm−2 using a liquid-metal ion source.
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Determination of the spring constants of probes for force microscopy/spectroscopy
TL;DR: In this article, a direct, accurate and convenient procedure for calibrating the spring constants of probes used for force microscopy/spectroscopy is described, which consists to deflecting an unknown cantilever with a'standard' lever, where the standard lever has been precalibrated.
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Focused Ion Beam Milling and Micromanipulation Lift-Out for Site Specific Cross-Section Tem Specimen Preparation
TL;DR: A site specific technique for cross-section transmission electron microscopy specimen preparation of difficult materials is presented in this paper, where focused ion beams are used to slice an electron transparent sliver of the specimen from a specific area of interest.
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Fundamentals of Focused Ion Beam Nanostructural Processing: Below, At, and Above the Surface
TL;DR: In this article, the authors considered the fundamentals of what happens in a solid when it is impacted by a medium-energy gallium ion and considered the FIB/sample interaction in three categories according to geometry: below, at and above the surface.
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Focused ion beam lithography
TL;DR: The use of focused ion beams for fine pattern writing was examined in this paper, where it was shown that the ability to write original patterns at 0.1 µm and below is a serious candidate for future fine pattern rewriting.
References
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Journal ArticleDOI
Focused ion beam technology and applications
TL;DR: The focused ion beam field has been spurred by the invention of the liquid metal ion source and by the utilization of focusing columns with mass separation capability, which has led to the use of alloy ion sources making available a large menu of ion species, in particular the dopants of Si and GaAs as discussed by the authors.
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A high‐intensity scanning ion probe with submicrometer spot size
TL;DR: In this article, a liquid metal gallium ion source was imaged by a unity-magnification single-gap accelerating lens with a postlens deflector to form a focused scanning probe.
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Ion source of high brightness using liquid metal
V. E. Krohn,G. R. Ringo +1 more
TL;DR: The beam from an EHD ion source using liquid gallium has been shown to have a brigtness of 0.9×105 A/cm−2 sr−1 at 21 kV and an energy spread of 12 eV at 10μA total current.
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Focused ion beam induced deposition of gold
TL;DR: A finely focused ion beam is scanned over a surface on which a local gas ambient of dimethyl gold hexafluoro acetylacetonate is created by a directed miniature nozzle.
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Liquid gold ion source
A. Wagner,T. M. Hall +1 more
TL;DR: The fabrication procedure for a liquid gold ion source is described in this article, where the source consists of a tungsten needle wetted with liquid gold, and stable gold ion currents of 1 to 100 μA have been reliably obtained.