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David J. Srolovitz

Researcher at City University of Hong Kong

Publications -  557
Citations -  30310

David J. Srolovitz is an academic researcher from City University of Hong Kong. The author has contributed to research in topics: Grain boundary & Dislocation. The author has an hindex of 87, co-authored 540 publications receiving 27162 citations. Previous affiliations of David J. Srolovitz include Los Alamos National Laboratory & University of Pennsylvania.

Papers
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Pyramidal structural defects in erbium silicide thin films

TL;DR: In this paper, the formation of these defects is not due to oxidation, but as a result of the separation of the silicide film from the substrate and its buckling in order to relieve the compressive, biaxial epitaxial stresses.
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Dislocation dynamics in the 2-d Frenkel-Kontorova model

TL;DR: In this article, the Frenkel-Kontorova (FK) model is generalized to two spatial dimensions and studied by finite temperature molecular dynamics simulations, including straight dislocations, dislocation loops and mechanisms for dislocation generation.
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Grain growth and solid-state dewetting of Bi-Crystal Ni-Fe thin films on sapphire

TL;DR: In this paper, the dewetting behavior of thin Ni80Fe20 films was studied in the range of temperatures of 1023 −1323 K and annealed under identical conditions.
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Self-healing of low angle grain boundaries by vacancy diffusion and dislocation climb

TL;DR: In this paper, a new analytical model was developed to quantify the role of dislocation climb assisted by vacancy pipe and bulk diffusion in controlling the damage resistance and self-healing of perturbed low angle grain boundaries.