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Devin Verreck

Researcher at Katholieke Universiteit Leuven

Publications -  61
Citations -  695

Devin Verreck is an academic researcher from Katholieke Universiteit Leuven. The author has contributed to research in topics: Field-effect transistor & Quantum tunnelling. The author has an hindex of 12, co-authored 52 publications receiving 507 citations. Previous affiliations of Devin Verreck include IMEC & Purdue University.

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Proceedings ArticleDOI

2D materials: roadmap to CMOS integration

TL;DR: The obstacles and paths to a scaled 2D CMOS solution are highlighted and the baseline requirements to challenge the advanced Si nodes are defined both with a physical compact model and TCAD analysis, which allows to identify the most promising 2D material and device design.
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Part I: Impact of Field-Induced Quantum Confinement on the Subthreshold Swing Behavior of Line TFETs

TL;DR: In this article, the authors present an insight into the TAT process in the presence of field-induced quantum confinement (FIQC) in line TFETs and show that the SS degradation is mainly caused by TAT through traps located in the bulk of the semiconductor nearby the gate dielectric.
Journal ArticleDOI

Quantum Mechanical Performance Predictions of p-n-i-n Versus Pocketed Line Tunnel Field-Effect Transistors

TL;DR: In this article, a p-n-i-n TFET with vertical pocket at the source-channel junction is compared with a line tunneling TFET, containing horizontal pockets in the source region.
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InGaAs tunnel FET with sub-nanometer EOT and sub-60 mV/dec sub-threshold swing at room temperature

TL;DR: InGaAs homojunction tunnel FETs with sub-60mV/dec sub-threshold swing (SS) measured in DC were demonstrated in this article, where Trap-Assisted Tunneling (TAT) is negligible in the device evidenced by low temperature dependence of the transfer characteristics.
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InGaAs tunnel diodes for the calibration of semi-classical and quantum mechanical band-to-band tunneling models

TL;DR: In this article, two simulators are calibrated for In0.53Ga0.47As using several p+/intrinsic/n+ diodes with different intrinsic region thicknesses.