Analysis of reverse-bias leakage current mechanisms in GaN grown by molecular-beam epitaxy

TLDR: In this article, temperature-dependent current-voltage measurements have been used to determine the reverse-bias leakage current mechanisms in Schottky diodes fabricated on GaN grown by molecular-beam epitaxy.

Abstract: Temperature-dependent current–voltage measurements have been used to determine the reverse-bias leakage current mechanisms in Schottky diodes fabricated on GaN grown by molecular-beam epitaxy, and two dominant mechanisms are clearly identified. The first mechanism is field-emission tunneling from the metal into the semiconductor, which is dominant at low temperatures and which, at higher temperatures, becomes significant for large reverse-bias voltages. The second mechanism, presumed to be associated with dislocation-related leakage current paths, is observed to have an exponential temperature dependence and becomes significant above approximately 275 K. The temperature dependence of the second mechanism is consistent with either one-dimensional variable-range-hopping conduction along the dislocation or trap-assisted tunneling.