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Journal ArticleDOI

Dynamic depletion mode: an E/D MOSFET circuit method for improved performance

Ronald W. Knepper
- 01 Oct 1978 - 
- Vol. 13, Iss: 5, pp 542-548
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TLDR
A new method of designing enhancement/depletion (E/D) MOSFET circuits, involving the dynamic or pulsed use of depletion-mode devices, is described, which can result in improvements in performance and/or power in the design of memory, logic, and driver circuits.
Abstract
A new method of designing enhancement/depletion (E/D) MOSFET circuits, involving the dynamic or pulsed use of depletion-mode devices, is described. The method can result in improvements in performance and/or power in the design of memory, logic, and driver circuits. The method is compared with the standard approach to the design of E/D circuits. Several circuits designed by the method have been simulated by use of a numerical circuit analysis program and have been placed on an experimental test chip. Theoretical and experimental results are presented.

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Citations
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Patent

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Journal ArticleDOI

Simple analytical models for the temperature dependent threshold behavior of depletion-mode devices

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References
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Journal ArticleDOI

An algorithm for dc solutions in an experimental general purpose interactive circuit design program

TL;DR: In this paper, an algorithm for computing dc solutions for electronic circuits is presented, which is shown to be reliable and efficient for practical circuits which include bipolar, FET, and Josephson junction circuits.
Proceedings ArticleDOI

Design of short-channel ion-implanted mosfets with relatively deep junctions

TL;DR: In this article, a short-channel ion-implanted MOSFET with relatively deep junctions is considered and four device parameters are considered: threshold and transconductance reduction, sub-threshold turn-on, and punch-through.
Patent

Method for producing improved transistor devices

TL;DR: In this article, the problem of aligning the gate electrode over the channel region, lying between the source region and the drain region of a field effect transistor, is particularly addressed and solved.
Proceedings ArticleDOI

Threshold adjustment of N-channel enhancement mode FETs by ion implantation

TL;DR: In this paper, the threshold voltage of n-channel enhancement mode FETs was determined as a function of implant dose and energy by measuring the difference in threshold voltage between implanted and unimplanted devices on the same wafer.
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