Proceedings ArticleDOI
E-beam lithography: an efficient tool for the fabrication of diffractive and micro-optical elements
Ernst-Bernhard Kley,Bernd Schnabel,Uwe D. Zeitner +2 more
- Vol. 3008, pp 222-232
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TLDR
In this paper, an overview of the use of e-beam lithography for the fabrication of surface profiles for microoptical and micromechanical devices becomes more and more important.Abstract:
The fabrication of surface profiles for microoptical and micromechanical devices becomes more and more important. Especially the high accuracy necessary for the realization of the functional components benefits from the use of e-beam lithography, either for the fabrication of tools for optical lithography and replication techniques or for the direct writing of the pattern. After a classification of the pattern and an introduction into the processes for the realization of surface structures we show examples for the basic structure classes as well as for the integration of several properties within one profile resulting in elements with higher complexity.read more
Citations
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Journal ArticleDOI
Flat Optics With Designer Metasurfaces
Nanfang Yu,Federico Capasso +1 more
TL;DR: This Review focuses on recent developments on flat, ultrathin optical components dubbed 'metasurfaces' that produce abrupt changes over the scale of the free-space wavelength in the phase, amplitude and/or polarization of a light beam.
Journal ArticleDOI
The MEMSNAS process: microloading effect for micromachining 3-D structures of nearly all shapes
TL;DR: In this article, a one-mask process was proposed to take advantage of the microloading effect of reactive ion etching (RIE) to obtain multiple levels of heights in an array of microholes of different diameters.
Book ChapterDOI
V Diffractive optics: Electromagnetic approach
TL;DR: In this article, the authors discuss the electromagnetic approach for diffractive optics in which rigorous electromagnetic theory is necessary or useful, and describe linear diffraction gratings, which produce two transmitted or reflected orders, the zeroth and (minus) first orders.
Proceedings ArticleDOI
Fabrication and application of subwavelength gratings
TL;DR: In this paper, the authors used a well-adapted e-beam writer 'LION LV1' which allows feature sizes of 100nm and below and arbitrary directions of the grating lines as well as radial, circular or elliptical grating line.
Journal ArticleDOI
Real-time photolithographic technique for fabrication of arbitrarily shaped microstructures
TL;DR: Peng et al. as mentioned in this paper proposed a real-time photolithographic technique to fabricate arbitrarily shaped micro-structures using LCD panels as realtime masks, based on a partial coherent imagingtheory.
References
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Journal ArticleDOI
Blazed gratings and Fresnel lenses fabricated by electron-beam lithography
TL;DR: A blazing technique using electron-beam lithography to achieve higher efficiency of gratings and Fresnel lenses is described, and the experimental results showed high-efficiency performance and nearly diffraction-limited focusing.
Journal ArticleDOI
Corrections to proximity effects in electron beam lithography. I. Theory
TL;DR: In this article, three corrections techniques are discussed: shape-dimension adjustment, region compensation, and self-consistent technique to compensate for proximity effects in regions between shapes, which leads to computational complexities and impracticalities.
Journal ArticleDOI
One-step 3D shaping using a gray-tone mask for optical and microelectronic applications
TL;DR: In this paper, a gray-tone mask was used to shape arbitrary profiles in fused silica substrates, and a high efficiency of 75% was obtained for the lenses with a photolithographic exposure and an etching step; it is realized on conventional equipment and is therefore cost effective.
Journal ArticleDOI
Fabrication of diffractive optical elements using a single optical exposure with a gray level mask
TL;DR: In this article, a method for mass fabrication of environmentally rugged monolithic diffractive optical elements (DOEs) is demonstrated, where a one-step optical exposure with a gray level mask was used to produce analog resist profiles that were transferred into their substrates using chemically assisted ion beam etching.
Proceedings ArticleDOI
E-beam lithography: a suitable technology for fabrication of high-accuracy 2D and 3D surface profiles
TL;DR: The challenges and obstacles of typical optical profiles with regard to e-beam writing technology are described and different writing strategies for the fabrication of binary, multilevel and continuous surface profiles are demonstrated.