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Galvanomagnetic effects in semiconductors
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The article was published on 1963-01-01 and is currently open access. It has received 194 citations till now.read more
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Journal ArticleDOI
A Model of Numerical Calculation of Conductivity for III-V MBE Epilayers Using a Hall Device
TL;DR: In this article, an electrical conduction versus temperature model using a Hall device was developed for the calculation of the carrier concentration and mobility of each component of a multicarrier system and the extracted concentrations are used to characterise the different components of charge transport in the active layer.
Journal ArticleDOI
Investigations of the Hall effect and conductivity of GaxIn1−xSb
TL;DR: In this paper, the results of theoretical calculations were compared with results of experiments in the temperature range 90 to 380 K and in magnetic fields from 0 to 283 kG on the basis of this comparison the scattering processes were discussed and parameters describing them were determined.
Journal ArticleDOI
Layered structure formation in Hg1−xCdxTe films after high-frequency sonication
TL;DR: In this article, the parameters of Hg1−xCdxTe thin films grown by liquid phase epitaxy and molecular-beam epitaxy were investigated before and after highfrequency sonication ( fUS = 7.5 MHz, WUS ∼ 10 W/m).
Book ChapterDOI
“Simple” acceptors B, Al, Ga, In, Tl in silicon
TL;DR: In this paper, absorption, photoconductivity, and Hall effect measurements for the acceptors B, Al, Ga, In, and Tl in silicon were discussed, and a satisfactory agreement between the results of optical and electrical experiments was still lacking.