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Journal ArticleDOI

High-speed short-wave infrared Si-based GeSn MQW phototransistor: an alternative to existing photodetectors

TLDR
In this article, the authors demonstrate high performance vertical GeSn multiple quantum well (MQW) heterojunction phototransistors (HPTs) on Si substrates for short-wave infrared (SWIR) applications.
Abstract
This work demonstrates high-performance vertical GeSn multiple quantum well (MQW) heterojunction phototransistors (HPTs) on Si substrates for short-wave infrared (SWIR) applications. Estimated results show a strong dependence on the number of QWs (N), incident optical power Pin and capture parameter β . Enhanced carrier and gain confinement cause an increase in responsivity of the device with the QWs in the base layer. However, the frequency performance of the device degrades with more QWs due to the increased forward transit time. On the other hand, the 3 dB cut-off frequency fT is the highest for the lower value of β . In addition, the detectivity and responsivity of the device decrease with an increase in incident optical power due to the change in base potential. The calculated results show that the 3 dB cut-off fT and maximum operating frequency fmax are 18{\text{ GHz}}$?> >18 GHz and 0.147{\text{ THz}}$?> >0.147 THz , respectively for N = 1 at 300 K. The detectivity and noise equivalent power are ∼109cmHz1/2/W and <10−12WHz−1/2 , respectively for N = 3 at 300 K under 0.4 applied bias voltage. These promising results of the presented GeSn MQW HPT can pave the way for efficient low-noise high-speed photodetection applications under a low applied bias voltage.

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Citations
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Journal ArticleDOI

GeSn-Based Multiple-Quantum-Well Photodetectors for Mid-Infrared Sensing Applications

TL;DR: In this paper , the authors presented the theory and simulation of heterojunction p-i-n MIR photodetectors (PDs) with Ge0.87Sn0.13/Ge0.92Sn 0.09 layer to elongate the photoabsorption path in the MIR spectrum.
Journal ArticleDOI

SiGeSn quantum well for photonics integrated circuits on Si photonics platform: a review

TL;DR: In this paper , the authors summarize the recent progress on development of SiGeSn QWs, including the fundamental optical and transition studies and optoelectronic device applications, and reveal the possibility of all-group-IV PICs with photonics and electronics monolithically integrated on a single-chip.
Proceedings ArticleDOI

Numerical Investigation of a New GeSn MIR Phototransistor based on IGZO TFT Platform

TL;DR: In this article , a new mid-infrared phototransistor (MIR PT) design based on InGaZnO (IGZO) thin-film (TF) and GeSn sensitive layer is proposed.
Journal ArticleDOI

Performance analysis of a new Mid-Infrared phototransistor based on combined graded band gap GeSn sensitive-film and IGZO TFT platform

TL;DR: In this paper , a novel InGaZnO (IGZO) thin-film mid-infrared phototransistor (TF MIR PT) based on GeSn capping layer with band-gap grading (BGG) aspect is proposed and numerically investigated.
Journal ArticleDOI

Lateral GeSn waveguide-based homojunction phototransistor for next-generation 2000 nm communication and sensing applications

TL;DR: In this article , a novel mid-infrared lateral Ge1 − x Sn x (x = 6%) waveguide-based phototransistors (PTs) on a silicon platform was proposed to enhance the optical confinement factor and the optical power through the i-GeSn WG, thereby, increasing the optical responsivity of the PTs.
References
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Journal ArticleDOI

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TL;DR: Laser emission from an InP/InGaAsP thin film epitaxial layer bonded to a Silicon-on-Insulator waveguide circuit was observed and this type of devices can be used as a photodetector.
Journal ArticleDOI

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Journal ArticleDOI

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TL;DR: In this paper, the energy band gaps and substitutional deep impurity levels of metastable alloys were predicted as a function of decreasing alloy composition and the indirect band structure of semiconducting Ge first becomes direct and then metallic.
Journal ArticleDOI

High-speed silicon modulators for the 2 μm wavelength band

TL;DR: In this paper, the authors demonstrate high-speed modulators based on a 220-nm silicon-on-insulator platform working at a wavelength of 1950nm, using the free carrier plasma dispersion effect in silicon.
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