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Statistical modeling of device mismatch for analog MOS integrated circuits

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TLDR
A generalized parameter-level statistical model, called statistical MOS (SMOS), capable of generating statistically significant model decks from intra- and inter-die parameter statistics is described, and Calculated model decks preserve the inherent correlations between model parameters while accounting for the dependence of parameter variance on device separation distance and device area.
Abstract
A generalized parameter-level statistical model, called statistical MOS (SMOS), capable of generating statistically significant model decks from intra- and inter-die parameter statistics is described. Calculated model decks preserve the inherent correlations between model parameters while accounting for the dependence of parameter variance on device separation distance and device area. Using a Monte Carlo approach to parameter sampling, circuit output means and standard deviations can be simulated. Incorporated in a CAD environment, these modeling algorithms will provide the analog circuit designer with a method to determine the effect of both circuit layout and device sizing on circuit output variance. Test chips have been fabricated from two different fabrication processes to extract statistical information required by the model. Experimental and simulation results for two analog subcircuits are compared to verify the statistical modeling algorithms. >

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References
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Journal ArticleDOI

Matching properties of MOS transistors

TL;DR: In this paper, the matching properties of the threshold voltage, substrate factor, and current factor of MOS transistors have been analyzed and measured, and the matching results have been verified by measurements and calculations on several basic circuits.
Journal ArticleDOI

Characterisation and modeling of mismatch in MOS transistors for precision analog design

TL;DR: In this paper, a characterization methodology is presented that accurately predicts the mismatch in drain current over a wide operating range using a minimum set of measured data and the physical causes of mismatch are discussed in detail for both p- and n-channel devices.
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Journal ArticleDOI

BSIM: Berkeley short-channel IGFET model for MOS transistors

TL;DR: The Berkeley short-channel IGFET model (BSIM) as discussed by the authors is an accurate and computationally efficient MOS transistor model, and its associated characterization facility for advanced integrated-circuit design is described.
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