Journal ArticleDOI
Three-dimensional nanostructure fabrication by focused-ion-beam chemical vapor deposition
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TLDR
In this paper, a 30 keV Ga+ focused ion beam assisted deposition using a aromatic hydrocarbon precursor was performed by a transmission microscope and Raman spectra, which indicated that the deposition film is a diamond-like amorphous carbon.Abstract:
Three-dimensional nanostructure fabrication has been demonstrated by 30 keV Ga+ focused ion beam assisted deposition using a aromatic hydrocarbon precursor. The characterization of deposited film on a silicon substrate was performed by a transmission microscope and Raman spectra. This result indicates that the deposition film is a diamondlike amorphous carbon. Production of three-dimensional nanostructure is discussed. Microcoil, drill, and bellows with 0.1 μm dimension were fabricated as parts of the microsystem. Furthermore, microstructure plastic arts is advocated as a new field using microbeam technology, presenting one example of a microwine glass with 2.75 μm external diameter and 12 μm height.read more
Citations
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Multifunctional surface structures of plants: An inspiration for biomimetics
TL;DR: In this article, the authors provide an overview of the most frequently functional surface structures of plants and their potential for technical use, leading to biomimetic inspired smart surfaces, which can be transferred into technical "biomimetic" materials.
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Physics of structural colors
TL;DR: Structural colors are deeply connected with recent rapidly growing fields of photonics and have been extensively studied to clarify their peculiar optical phenomena as mentioned in this paper, which differs considerably from the ordinary coloration mechanisms such as in pigments, dyes and metals, where the colors are produced by virtue of the energy consumption of light.
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Recent Developments in Nanofabrication Using Focused Ion Beams
TL;DR: The recent developments of the FIB technology are examined with emphasis on its ability to fabricate a wide variety of nanostructures and its abilities of writing structures with nanoscale accuracy.
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Ion beam lithography and nanofabrication: a review
TL;DR: In this article, the physical principles underlying ion beam interactions with materials are described, together with a comparison with other lithographic techniques (electron beam writing a, p-beam writing, and ion projection projection lithography).
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Creating pure nanostructures from electron-beam-induced deposition using purification techniques: a technology perspective
TL;DR: In this paper, a review and comparison of the techniques specifically aimed at purifying impure electron-beam-induced deposition (EBID) structures is presented, and the authors highlight some general trends: application of heat (during or after deposition) is usually beneficial to some extent; working in a favorable residual gas (ultra-high vacuum set-ups or plasma cleaning the chamber) is highly recommended; gas mixing approaches are extremely variable and not always reproducible between research groups; and carbon-free precursors are promising but tend to result in oxygen being the contaminant
References
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Journal ArticleDOI
Raman spectra of diamondlike amorphous carbon films
TL;DR: In this article, the relative intensity of a 1400 cm−1 band against a 1530 cm− 1 band was found to decrease with an increase of sp3 content in amorphous carbon (a•C) films.
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Characterization and Application of Materials Grown by Electron-Beam-Induced Deposition
TL;DR: In this article, high-resolution transmission electron microscope analysis of the deposits reveals a new class of nanocrystalline compound materials, which are created from organometallic precursors which form resistors with a resistivity ranging from 103 Ω cm to 2×10-3 µ cm and sustain current densities higher than 5×105 A/cm2.
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X‐ray mask repair with focused ion beams
TL;DR: In this article, focused ion beams were used for the repair of defects in x-ray masks in a manner analogous to a scanning electron microscope, and the effect of ion channeling on imaging and opaque repair was also described.
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Nanostructure fabrication using electron beam and its application to nanometer devices
TL;DR: In this article, the self-developing properties of an AlF/sub 3/doped LiF inorganic resist have been studied for sub-10-nm lithography.