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Eric M. Gullikson

Researcher at Lawrence Berkeley National Laboratory

Publications -  424
Citations -  15937

Eric M. Gullikson is an academic researcher from Lawrence Berkeley National Laboratory. The author has contributed to research in topics: Extreme ultraviolet lithography & Extreme ultraviolet. The author has an hindex of 45, co-authored 412 publications receiving 14639 citations. Previous affiliations of Eric M. Gullikson include University of California, San Diego & University of California, Berkeley.

Papers
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Journal ArticleDOI

Effects of O and N impurities on the nanostructural evolution during growth of Cr/Sc multilayers

TL;DR: In this paper, the influence of impurities N and O as residual gas elements on the growth, structure, and optical performance of transition metal multilayers was investigated in high vacuum conditions by a dual cathode direct current magnetron sputter deposition.
Proceedings ArticleDOI

Out-of-band exposure characterization with the SEMATECH Berkeley 0.3-NA microfield exposure tool

TL;DR: In this paper, the authors present the optical design for the new DUV component and the simulation-based results predicting the potential impact of OOB based on known resist, mask, and multilayer conditions.
Proceedings ArticleDOI

Defect repair for extreme-ultraviolet lithography (EUVL) mask blanks

TL;DR: In this article, the authors discuss the selection of a capping layer for amplitude-defect repair, and report on experimental results of the reflectance variation over the amplitude defect repair zone for different capping layers.
Journal ArticleDOI

Optical constants of magnetron sputtered Pt thin films with improved accuracy in the N- and O-electronic shell absorption regions

TL;DR: In this article, a self-consistent determination of the optical constants (refractive index) of Pt using a combination of photoabsorption and reflectance data in the photon energy range 25 −778 eV was presented.