E
Eric M. Gullikson
Researcher at Lawrence Berkeley National Laboratory
Publications - 424
Citations - 15937
Eric M. Gullikson is an academic researcher from Lawrence Berkeley National Laboratory. The author has contributed to research in topics: Extreme ultraviolet lithography & Extreme ultraviolet. The author has an hindex of 45, co-authored 412 publications receiving 14639 citations. Previous affiliations of Eric M. Gullikson include University of California, San Diego & University of California, Berkeley.
Papers
More filters
Journal ArticleDOI
Soft-x-ray resonant scattering from V/Fe(001) magnetic superlattices
Maurizio Sacchi,Alessandro Mirone,Coryn F. Hague,J.-M. Mariot,Luca Pasquali,P. Isberg,Eric M. Gullikson,James H. Underwood +7 more
TL;DR: In this paper, the magnetic properties of Fe and V in (n ML V / 5 ML Fe) (001) superlattices (n=1, 2, and 5 ML) have been investigated by measuring the magnetization dependent scattering of elliptically polarized soft x rays at various scattering angles and for photon energies across the 2p x-ray-absorption edges of both F and V.
Proceedings ArticleDOI
Initial results from the EUV engineering test stand
Daniel A. Tichenor,Avijit K. Ray-Chaudhuri,Sang Hun Lee,Henry N. Chapman,William C. Replogle,Kurt W. Berger,Richard H. Stulen,Glenn D. Kubiak,Leonard E. Klebanoff,John B. Wronosky,Donna J. O'Connell,Alvin H. Leung,Karen J. Jefferson,W. P. Ballard,Layton C. Hale,Kenneth L. Blaedel,John S. Taylor,James A. Folta,Eberhard Spiller,Regina Soufli,Gary E. Sommargren,Donald W. Sweeney,Patrick P. Naulleau,Kenneth A. Goldberg,Eric M. Gullikson,Jeffrey Bokor,David Attwood,Uwe Mickan,Ralph M. Hanzen,Eric M. Panning,Pei-yang Yan,J. E. Bjorkholm,Charles W. Gwyn +32 more
TL;DR: The Engineering Test Stand (ETS) as mentioned in this paper is an EUV lithography tool designed to demonstrate full-field EUV imaging and provide data required to accelerate production-tool development.
Journal ArticleDOI
High-efficiency x-ray gratings with asymmetric-cut multilayers
TL;DR: It is shown that an asymmetric-cut multilayer structure can act as a near-perfect blazed grating, and it is predicted that such structures should also be effective at shorter x-ray wavelengths.
Journal ArticleDOI
Masked deposition techniques for achieving multilayer period variations required for short-wavelength (68-A) soft-x-ray imaging optics.
TL;DR: Practical issues in the development of multilayer coatings for reflective imaging systems operating at λ ≈ 68 Å are discussed and new deposition techniques that use masks to correct the period variation across the curved surfaces of each optic are developed to ensure reflectance over the entire clear aperture.
Journal ArticleDOI
Standing-wave excited soft x-ray photoemission microscopy: Application to Co microdot magnetic arrays
Alexander X. Gray,Florian Kronast,Christian Papp,See-Hun Yang,Stefan Cramm,I. P. Krug,Farhad Salmassi,Eric M. Gullikson,Dawn L. Hilken,Erik H. Anderson,Peter Fischer,Hermann A. Dürr,Claus M. Schneider,Charles S. Fadley +13 more
TL;DR: In this paper, the authors demonstrate the addition of depth resolution to the usual two-dimensional images in photoelectron emission microscopy (PEEM), with application to a square array of circular magnetic Co microdots.