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M

M.C.M. van de Sanden

Researcher at Eindhoven University of Technology

Publications -  208
Citations -  5050

M.C.M. van de Sanden is an academic researcher from Eindhoven University of Technology. The author has contributed to research in topics: Silicon & Thin film. The author has an hindex of 31, co-authored 208 publications receiving 4346 citations.

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The 2017 Plasma Roadmap: Low temperature plasma science and technology

Igor Adamovich, +38 more
- 14 Jul 2017 - 
TL;DR: The 2017 plasmas roadmap as mentioned in this paper is the first update of a planned series of periodic updates of the Plasma Roadmap, which was published by the Journal of Physics D: Applied Physics in 2012.
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High efficiency n-type Si solar cells on Al2O3-passivated boron emitters

TL;DR: In this paper, negative charge dielectric Al2O3 was applied as surface passivation layer on high-efficiency n-type silicon solar cells, achieving a confirmed conversion efficiency of 23.2% on B-doped emitters.
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Plasma-assisted atomic layer deposition of Al2O3 moisture permeation barriers on polymers

TL;DR: In this article, thin Al2O3 films of different thicknesses (10−40nm) were deposited by plasma-assisted atomic layer deposition on substrates of poly(2,6-ethylenenenaphthalate) (PEN), and the water vapor transmission rate (WVTR) values were measured by means of the calcium test.
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Evolution of the electrical and structural properties during the growth of Al doped ZnO films by remote plasma-enhanced metalorganic chemical vapor deposition

TL;DR: In this paper, the electrical, structural, and chemical properties of al-doped zinc oxide (AZO) films were investigated using Hall, four point probe, x-ray diffraction (XRD), scanning electron microscopy (SEM), atomic force microscopy, AFM, electron recoil detection (ERD), Rutherford backscattering (RBS), and time of flight secondary ion mass spectrometry (TOF-SIMS), respectively.
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Oxygen evolution at hematite surfaces : the impact of structure and oxygen vacancies on lowering the overpotential

TL;DR: In this article, the authors investigate the structure sensitivity of the oxygen evolution reaction (OER) at 11 hematite surfaces with density functional theory + Hubbard U (DFT+U) calculations.