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Z. Lj. Petrović

Researcher at Serbian Academy of Sciences and Arts

Publications -  213
Citations -  7814

Z. Lj. Petrović is an academic researcher from Serbian Academy of Sciences and Arts. The author has contributed to research in topics: Electron & Monte Carlo method. The author has an hindex of 40, co-authored 210 publications receiving 6966 citations. Previous affiliations of Z. Lj. Petrović include Keio University & University of Colorado Boulder.

Papers
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Plasma-liquid interactions: A review and roadmap

TL;DR: A review of the state-of-the-art of this multidisciplinary area and identifying the key research challenges is provided in this paper, where the developments in diagnostics, modeling and further extensions of cross section and reaction rate databases are discussed.
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Cold-cathode discharges and breakdown in argon: surface and gas phase production of secondary electrons

TL;DR: In this article, the authors present the data and models describing the secondary electrons that initiate the secondary and subsequent feedback avalanches required for the growth of current during breakdown and for the maintenance of low-current, cold-cathode discharges in argon.
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The 2017 Plasma Roadmap: Low temperature plasma science and technology

Igor Adamovich, +38 more
- 14 Jul 2017 - 
TL;DR: The 2017 plasmas roadmap as mentioned in this paper is the first update of a planned series of periodic updates of the Plasma Roadmap, which was published by the Journal of Physics D: Applied Physics in 2012.
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Measurement and interpretation of swarm parameters and their application in plasma modelling

TL;DR: In this article, the current status of the physics of charged particle swarms, mainly electrons, having plasma modelling in mind, is discussed and the need for reinitiating the swarm experiments and where and how those would be useful.
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Functional separation of biasing and sustaining voltages in two-frequency capacitively coupled plasma

TL;DR: In this article, the authors measured the space profiles of the net excitation rate of Ar(3p5) for a two-frequency capacitively coupled plasma as a representation of a typical oxide etcher.