Journal ArticleDOI
Aluminum oxide from trimethylaluminum and water by atomic layer deposition: The temperature dependence of residual stress, elastic modulus, hardness and adhesion
Oili Ylivaara,Xuwen Liu,Lauri Kilpi,Jussi Lyytinen,Dieter Schneider,Mikko Laitinen,Jaakko Julin,Saima Ali,Sakari Sintonen,Maria Berdova,Eero Haimi,Timo Sajavaara,Helena Ronkainen,Harri Lipsanen,Jari Koskinen,Simo-Pekka Hannula,Riikka L. Puurunen +16 more
TLDR
In this paper, a comprehensive characterization of the stress, elastic modulus, hardness and adhesion of ALD aluminum oxide (Al2O3) films grown at 110-300°C from trimethylaluminum and water is presented.About:
This article is published in Thin Solid Films.The article was published on 2014-02-03. It has received 144 citations till now. The article focuses on the topics: Elastic modulus & Atomic layer deposition.read more
Citations
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Journal ArticleDOI
Reaction and Growth Mechanisms in Al2O3 deposited via Atomic Layer Deposition: Elucidating the Hydrogen Source
TL;DR: In this article, the authors quantitatively elucidated the source of hydrogen content in the atomic layer deposition of Al2O3 at different temperatures (80 −220 °C), by replacing the H2O precursor with heavy water (D2O) to use as a tracer and discern between the H coming from the unreacted metal precursor ligands and that from unreacted −OD (hydroxyl) groups coming from heavy water.
Journal ArticleDOI
Review—Investigation and Review of the Thermal, Mechanical, Electrical, Optical, and Structural Properties of Atomic Layer Deposited High-k Dielectrics: Beryllium Oxide, Aluminum Oxide, Hafnium Oxide, and Aluminum Nitride
John T. Gaskins,Patrick E. Hopkins,Devin R. Merrill,Devin R. Merrill,Sage R. Bauers,Erik C. Hadland,David W. Johnson,Donghyi Koh,Donghyi Koh,Jung Hwan Yum,Sanjay K. Banerjee,Bradley J. Nordell,Michelle M. Paquette,Anthony N. Caruso,William A. Lanford,Patrick Henry,Liza Ross,Han Li,Liyi Li,Marc C. French,Antonio M. Rudolph,Sean W. King +21 more
TL;DR: Gaskins et al. as mentioned in this paper investigated the thermal, mechanical, electrical, optical, and structural properties of atomic layer deposited high-k dielectrics: Beryllium Oxide, aluminum oxide, Hafnium oxide, and aluminum nitride.
Journal ArticleDOI
Low-Loss BaTiO3–Si Waveguides for Nonlinear Integrated Photonics
Felix Eltes,Daniele Caimi,Florian Fallegger,Marilyne Sousa,Eamon O'Connor,Marta D. Rossell,Bert Jan Offrein,Jean Fompeyrine,Stefan Abel +8 more
TL;DR: In this article, the authors identify the origin of high optical propagation losses and demonstrate a path to fabricate low-loss BaTiO3-Si waveguides with propagation losses of only 6 dB/cm.
Journal ArticleDOI
Low-loss integrated photonics for the blue and ultraviolet regime
Gavin N. West,William Loh,Dave Kharas,Cheryl Sorace-Agaskar,Karan K. Mehta,Jeremy M. Sage,John Chiaverini,Rajeev J. Ram +7 more
TL;DR: In this paper, a low-loss integrated photonics platform in the visible and near ultraviolet (UV) regime is presented, where fully etched waveguides based on ALD of aluminum oxide operate in a single transverse mode with <3 dB/cm propagation loss at a wavelength of 371 nm.
Journal ArticleDOI
Ultralight shape-recovering plate mechanical metamaterials
Keivan Davami,Lin Zhao,Eric Lu,John Cortes,Chen Lin,Drew E. Lilley,Prashant K. Purohit,Igor Bargatin +7 more
TL;DR: A class of nanoscale mechanical metamaterials created by forming continuous corrugated plates out of ultrathin films that can be engineered to be extremely flat and have the ability to ‘pop-back' to their original shape without damage even after undergoing multiple sharp bends of more than 90°.
References
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Journal ArticleDOI
An improved technique for determining hardness and elastic modulus using load and displacement sensing indentation experiments
Warren C. Oliver,George M. Pharr +1 more
TL;DR: In this paper, the authors used a Berkovich indenter to determine hardness and elastic modulus from indentation load-displacement data, and showed that the curve of the curve is not linear, even in the initial stages of the unloading process.
Journal ArticleDOI
The Tension of Metallic Films Deposited by Electrolysis
TL;DR: It is well known that metallic films deposited electrolytically are in many cases liable to peel off if deposited to any considerable thickness as discussed by the authors, especially if it does not adhere very tightly to the body on which it is deposited.
Book
The Materials Science of Thin Films
TL;DR: A review of materials science can be found in this paper, where the authors describe the properties of thin-film materials and their applications in the following categories: electrical and magnetic properties, optical properties, and material properties.