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Journal ArticleDOI

Nanoimprint lithography for the fabrication of DNA electrophoresis chips

TLDR
In this paper, the fabrication of microfluidic devices for bio-molecule separation using an array of well-defined nanostructures is described, using epifluorescence microscopy, using a fluorescein solution to track fluid penetration inside the high density nanostructure region.
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This article is published in Microelectronic Engineering.The article was published on 2002-07-01. It has received 63 citations till now. The article focuses on the topics: Nanoimprint lithography & Lithography.

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Citations
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Journal ArticleDOI

Polymer microfabrication technologies for microfluidic systems

TL;DR: This review will introduce the currently relevant microfabrication technologies such as replication methods like hot embossing, injection molding, microthermoforming and casting as well as photodefining methods like lithography and laser ablation for microfluidic systems and discuss academic and industrial considerations for their use.
Journal ArticleDOI

Bonding of thermoplastic polymer microfluidics

TL;DR: A review of techniques for sealing thermoplastic microfluidics can be found in this paper, where the authors discuss a number of practical issues surrounding these various bonding methods and discuss a set of unique challenges which must be addressed to achieve optimal sealing results.
Journal ArticleDOI

Room-Temperature, Low-Pressure Nanoimprinting Based on Cationic Photopolymerization of Novel Epoxysilicone Monomers.

TL;DR: A new UV-curable liquid resist based on cationic polymerization of silicone epoxies has been developed for UV-assisted nanoimprint lithography, which can be easily spin-coated using a suitable undercoating layer on a substrate.
Journal ArticleDOI

Full wafer scale near zero residual nano-imprinting lithography using UV curable monomer solution

TL;DR: In this paper, a pressure vessel type imprinting system was used to imprint the patterns as small as 150 nm over whole 4-in. diameter wafer with near zero residual layer.
Journal ArticleDOI

Wafer to wafer nano-imprinting lithography with monomer based thermally curable resin

TL;DR: In this article, a thermally curable monomer solution was used for the imprinting process in order to lower imprinting pressure and temperature, and a unique pressure vessel type imprinting system was used to imprint patterns as small as 150 nm over a whole 6 in. diameter wafer at a relatively low temperature (80 ^oC) and pressure (20 atm).
References
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Journal ArticleDOI

Imprint of sub-25 nm vias and trenches in polymers

TL;DR: In this article, a nanoimprint process that presses a mold into a thin thermoplastic polymer film on a substrate to create vias and trenches with a minimum size of 25 nm and a depth of 100 nm has been demonstrated.
Journal ArticleDOI

Flexible Methods for Microfluidics

TL;DR: In this article, the authors present new fabrication challenges and finding new applications in biology, chemistry, and materials science for handling nanoliter quantities of fluids, which is a new fabrication challenge.
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Room-temperature imprinting method for plastic microchannel fabrication

TL;DR: A new plastic imprinting method using a silicon template is demonstrated, which obviates the necessity of heating the plastic substrate during the stamping process, thus improving the device yield from approximately 10 devices to above 100 devices per template.
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Fast separation of oligonucleotide and triplet repeat DNA on a microfabricated capillary electrophoresis device and capillary electrophoresis.

TL;DR: It is demonstrated that an only 6 mm separation channel is sufficient for the separation of triplet repeat DNA fragment and DNA molecular marker within only 12 s, which is at least 18 times faster than the same separation carried out by conventional capillary electrophoresis with 24.5 cm effective length.
Journal ArticleDOI

Nanoimprint and micro-contact printing tri-layer processes

TL;DR: In this paper, two tri-layer pattern-transfer techniques are described, which can be used to improve the process latitude and the process compatibility in nano-imprint and micro-contact printing.
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