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Journal ArticleDOI

Silicon carbide high-power devices

TLDR
In this paper, a wide variety of SiC devices are compared to that of similar Si and GaAs devices and to theoretically expected results, and the performance of these devices is compared to the expected results.
Abstract
In recent years, silicon carbide has received increased attention because of its potential for high-power devices. The unique material properties of SiC, high electric breakdown field, high saturated electron drift velocity, and high thermal conductivity are what give this material its tremendous potential in the power device arena. 4H-SiC Schottky barrier diodes (1400 V) with forward current densities over 700 A/cm/sup 2/ at 2 V have been demonstrated. Packaged SITs have produced 57 W of output power at 500 MHz, SiC UMOSFETs (1200 V) are projected to have 15 times the current density of Si IGBTs (1200 V). Submicron gate length 4H-SiC MESFETs have achieved f/sub max/=32 GHz, f/sub T/=14.0 GHz, and power density=2.8 W/mm @ 1.8 GHz. The performances of a wide variety of SiC devices are compared to that of similar Si and GaAs devices and to theoretically expected results.

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Citations
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Journal ArticleDOI

Silicon carbide benefits and advantages for power electronics circuits and systems

TL;DR: The benefits of using SiC in power electronics applications are looked at, the current state of the art of SiC is reviewed, and how SiC can be a strong and viable candidate for future power electronics and systems applications are shown.
Journal ArticleDOI

Silicon carbide: A unique platform for metal-oxide-semiconductor physics

TL;DR: In this paper, the authors reviewed the most exciting recent progress in interface engineering for improving the channel mobility and fundamental understanding of channel transport in 4H-SiC power metal oxide Semiconductor Field Effect Transistors.
Journal ArticleDOI

Design considerations and experimental analysis of high-voltage SiC Schottky barrier rectifiers

TL;DR: In this paper, the reverse leakage current is observed to depend on device area, Schottky barrier height, electric field at the metal-semiconductor interface, and temperature (a decreasing temperature dependence with increasing reverse bias).
Journal ArticleDOI

High-voltage Ni- and Pt-SiC Schottky diodes utilizing metal field plate termination

TL;DR: In this paper, 1 kV 4H and 6 h SiC Schottky diodes utilizing a metal-oxide overlap structure for electric field termination were fabricated using Ni-SiC ohmic contact formation.
Journal ArticleDOI

Performance limiting surface defects in SiC epitaxial p-n junction diodes

TL;DR: In this paper, the effects of surface defects on performance of kV-class 4H- and 6H-SiC epitaxial p-n junction diodes were investigated.
References
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Proceedings Article

Physics of semiconductor devices

S. M. Sze
Journal ArticleDOI

Large‐band‐gap SiC, III‐V nitride, and II‐VI ZnSe‐based semiconductor device technologies

TL;DR: In this article, the authors compare the performance of SiC, GaN, and ZnSe for high-temperature electronics and short-wavelength optical applications and conclude that SiC is the leading contender for high temperature and high power applications if ohmic contacts and interface state densities can be further improved.
Journal ArticleDOI

Comparison of 6H-SiC, 3C-SiC, and Si for power devices

TL;DR: In this paper, the drift region properties of 6H- and 3C-SiC-based Schottky rectifiers and power MOSFETs that result in breakdown voltages from 50 to 5000 V are defined.
Journal ArticleDOI

Power semiconductor device figure of merit for high-frequency applications

TL;DR: In this paper, the authors derived the Baliga high-frequency figure of merit for power semiconductor devices operating in high frequency circuits and showed that significant performance improvement can be achieved by replacing silicon with gallium arsenide, silicon carbide, or semiconducting diamond.
Journal ArticleDOI

Optimum semiconductors for high-power electronics

TL;DR: In this article, the peak electric field strength at avalanche breakdown was used as a critical material parameter for evaluating the quality of a semiconducting material for high-power electronics, and it was shown that SiC and diamond could offer significant advantages compared to either silicon or group III-V compound semiconductors for these applications.
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