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High-voltage Ni- and Pt-SiC Schottky diodes utilizing metal field plate termination

TLDR
In this paper, 1 kV 4H and 6 h SiC Schottky diodes utilizing a metal-oxide overlap structure for electric field termination were fabricated using Ni-SiC ohmic contact formation.
Abstract
We have fabricated 1 kV 4H and 6H SiC Schottky diodes utilizing a metal-oxide overlap structure for electric field termination. This simple structure when used with a high barrier height metal such as Ni has consistently given us good yield of Schottky diodes with breakdown voltages in excess of 60% of the theoretically calculated value. This paper presents the design considerations, the fabrication procedure, and characterization results for these 1 kV Ni-SiC Schottky diodes. Comparison to similarly fabricated Pt-SiC Schottky diodes is reported. The Ni-SiC ohmic contact formation has been studied using Auger electron spectroscopy and X-ray diffraction. The characterization study includes measurements of current-voltage (I-V) temperature and capacitance-voltage (C-V) temperature characteristics. The high-temperature performance of these diodes has also been investigated. The diodes show good rectifying behavior with ON/OFF current ratios, ranging from 10/sup 6/ to 10 at 27/spl deg/C and in excess of 10/sup 6/ up to 300/spl deg/C.

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Citations
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Journal ArticleDOI

Review of Silicon Carbide Power Devices and Their Applications

TL;DR: The technology progress of SiC power devices and their emerging applications are reviewed and the design challenges and future trends are summarized.
Journal ArticleDOI

$\hbox{Ga}_{2} \hbox{O}_{3}$ Schottky Barrier Diodes Fabricated by Using Single-Crystal $\beta$ – $\hbox{Ga}_{2} \hbox{O}_{3}$ (010) Substrates

TL;DR: In this article, the authors fabricated gallium oxide (Ga2O3) Schottky barrier diodes using single-crystal substrates produced by the floating-zone method.
Journal ArticleDOI

Richardson’s constant in inhomogeneous silicon carbide Schottky contacts

TL;DR: In this paper, the electrical characterization of nickel silicide Schottky contacts on silicon carbide (4H-SiC) was reported, and the Tung's model was used to determine the Richardson's constant A**.
Journal ArticleDOI

Group‐III Sesquioxides: Growth, Physical Properties and Devices

TL;DR: The group-III sesquioxides possess material properties that render them interesting for applications such as high-power rectifiers and transistors, solar-blind UV detectors and inter-sub-band infrared detectors as mentioned in this paper.
Journal ArticleDOI

Planar edge termination design and technology considerations for 1.7-kV 4H-SiC PiN diodes

TL;DR: In this paper, the authors compared different planar edge termination techniques on high-voltage 4H-SiC PiN diodes, including single and double junction termination extensions (JTE), floating guard rings, and a novel termination structure, the so-called "floating guard rings-assisted JTE."
References
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Journal ArticleDOI

Extraction of Schottky diode parameters from forward current-voltage characteristics

TL;DR: In this article, the forward current densityvoltage (J•V) characteristics of a Schottky diode were used to determine the ideality factor n, the barrier height φB, and the series resistance R of the diode with one single I•V measurement.
Journal ArticleDOI

Current transport in metal-semiconductor barriers

TL;DR: In this paper, a theory for calculating the magnitude of majority carrier current flow in metal-semiconductor barriers is developed which incorporates Schottky's diffusion (D) theory and Bethe's thermionic emission (T) theory into a single T-D emission theory, and which includes the effects of the image force.
Journal ArticleDOI

Silicon carbide high-power devices

TL;DR: In this paper, a wide variety of SiC devices are compared to that of similar Si and GaAs devices and to theoretically expected results, and the performance of these devices is compared to the expected results.
Journal ArticleDOI

High performance of high-voltage 4H-SiC Schottky barrier diodes

TL;DR: In this paper, the performance of high-voltage rectifiers using 4H-SiC Schottky barrier diodes was investigated. And the barrier heights of these contact metals, Au, Ni, and Ti were determined by the analysis of currentvoltage characteristics, and the reduction of power loss could be achieved by controlling the barrier height.
Journal ArticleDOI

Excellent reverse blocking characteristics of high-voltage 4H-SiC Schottky rectifiers with boron-implanted edge termination

TL;DR: In this paper, the edge termination of Ti/4H-SiC Schottky rectifiers was successfully fabricated by using highly resistive layers at the periphery of Schotty contacts, which were formed by B/sup +/ implantation followed by heat treatment to improve the crystallinity of implanted layers.
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