Journal ArticleDOI
Surface Studies of Solids by Total Reflection of X-Rays
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TLDR
In this paper, the shape of the curve of reflected x-ray intensity vs glancing angle in the region of total reflection was analyzed to study certain structural properties of the mirror surface about 10 to several hundred angstroms deep.Abstract:
Analysis of the shape of the curve of reflected x-ray intensity vs glancing angle in the region of total reflection provides a new method of studying certain structural properties of the mirror surface about 10 to several hundred angstroms deep. Dispersion theory, extended to treat any (small) number of stratified homogeneous media, is used as a basis of interpretation.Curves for evaporated copper on glass at room temperature are studied as an example. These curves may be explained by assuming that the copper (exposed to atmospheric air at room temperature) has completely oxidized about 150A deep. If oxidation is less deep, there probably exists some general reduction of density (e.g., porosity) and an electron density minimum just below an internal oxide seal. This seal, about 25A below the nominal surface plane, arrests further oxidation of more deeply-lying loose-packed copper crystallites.All measurements to date have been carried out under laboratory atmospheric conditions which do not allow satisfactory separation or control of the physical and chemical variables involved in the surface peculiarities. The method, under more controlled conditions of preparation and treatment of the surface, promises to be useful.read more
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Journal ArticleDOI
Microscratch testing method for systematic evaluation of the adhesion of atomic layer deposited thin films on silicon
Lauri Kilpi,Oili Ylivaara,Antti Vaajoki,Jari Malm,Sakari Sintonen,Marko Tuominen,Riikka L. Puurunen,Helena Ronkainen +7 more
TL;DR: In this article, the critical loads suitable for ALD coating adhesion evaluation on silicon wafers were determined as LCSi1, LCSi2, LCALD1, and LCALD2, representing the failure points of the silicon substrate and the coating delamination points.
Patent
X-ray analyzer for testing layered structures
TL;DR: X-ray fluorescence produced by a primary X-ray beam incident at a very flat angle (below 1°) onto the surface of a specimen contained in a vacuum chamber is used to analyze shallow layers and/or to determine depths of shallow surface layers, such as a very thin (typically about 10A and 10 3 A) silicon coating on Al or Cu layers which overlay a silicon substrate as discussed by the authors.
Journal ArticleDOI
Quantitative Structure and Property Analysis of Nanoporous Low Dielectric Constant SiCOH Thin Films
TL;DR: In this paper, the authors carried out grazing incidence X-ray scattering measurements and specular Xray reflectivity analysis of the nanoporous structures of low dielectric constant (low k) carbon-doped silicon oxide (SiCOH) films, which were prepared with plasmaenhanced chemical vapor deposition (PECVD) from vinyltrimethylsilane, divinyldimethylmethylane, and tetravinylsilane precursors and oxygen gas as an oxidant and then thermally annealed under various conditions.
Journal ArticleDOI
Time-resolved Morphological Study of Bulk Heterojunction Films for Efficient Organic Solar Devices
Barbara Paci,Amanda Generosi,V. Rossi Albertini,Renato Generosi,P. Perfetti,R. de Bettignies,Carole Sentein +6 more
TL;DR: In this article, the nanoscale morphology of bulk heterojunction organic films for photovoltaic applications was studied by time-resolved energy dispersive X-ray reflectometry in synergy with atomic force microscopy analysis.
Journal ArticleDOI
Structure Formation in Two-Dimensionally Confined Diblock Copolymer Films
TL;DR: In this article, the surface topography and chemical morphology of poly(styrene-block-paramethylstyrene) diblock copolymers confined within isolated drops are investigated.