Journal ArticleDOI
Theoretical aspects of atomic mixing by ion beams
Peter Sigmund,A. Gras-Marti +1 more
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TLDR
In this paper, the half-widths of matrix relocation profiles were determined explicitly for ion-impurity knockon events (recoil implantation) as well as isotropic cascade mixing.About:
This article is published in Nuclear Instruments and Methods.The article was published on 1981-04-15. It has received 443 citations till now. The article focuses on the topics: Mixing (physics).read more
Citations
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Journal ArticleDOI
Ion Beam Induced Mixing in Bubble Garnet Films
Journal ArticleDOI
MC computer simulations of the preferential sputtering of Si-Ge alloys
TL;DR: In this paper, the ability of MC codes to predict the preferential sputtering of compound targets is investigated and the DYNA and TRIDYN codes are run for 3 keV Ar + bombardment of a SiGe binary target.
Book ChapterDOI
Unique Effects of Ion Irradiation
TL;DR: This chapter will focus on processes that are unique to ion bombardment of metals and alloys in fusion reactor systems in which the reaction products consist of energetic helium and hydrogen ions that impact the first wall and other components.
Journal ArticleDOI
Solubility enhancement and Au-Ni bimetallic alloy formation in immiscible Au/Ni multilayers by ion irradiation
TL;DR: In this paper , the authors investigated ion beam mixing and grain growth induced in [Au/Ni] × 5 /Si multilayer by 500 keV Xe ion irradiation at different fluence values, using Field Emission Scanning Electron Microscopy (FESEM), X-ray Diffraction (XRD) and Rutherford Backscattering (RBS).
References
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Journal ArticleDOI
Handbook of Mathematical Functions
Journal ArticleDOI
Theory of Sputtering. I. Sputtering Yield of Amorphous and Polycrystalline Targets
TL;DR: In this article, an integrodifferential equation for the sputtering yield is developed from the general Boltzmann transport equation, and solutions of the integral equation are given that are asymptotically exact in the limit of high ion energy as compared to atomic binding energies.
Journal ArticleDOI
The depth resolution of sputter profiling
TL;DR: In this article, it is shown that the bulk radiation damage accompanying sputtering events sets ultimate limits to the depth resolution attainable in sputter profiling, and guidelines for selection of projectile species and energies to minimize such mixing are given and numerical estimates for attainable depth resolutions.