Journal ArticleDOI
Theoretical aspects of atomic mixing by ion beams
Peter Sigmund,A. Gras-Marti +1 more
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In this paper, the half-widths of matrix relocation profiles were determined explicitly for ion-impurity knockon events (recoil implantation) as well as isotropic cascade mixing.About:
This article is published in Nuclear Instruments and Methods.The article was published on 1981-04-15. It has received 443 citations till now. The article focuses on the topics: Mixing (physics).read more
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Journal ArticleDOI
A sum rule for unbiased Brownian motion, and generalisations of Fick's law for space-dependent diffusivity
R Collins,T Takemori +1 more
TL;DR: In this paper, a simple sum rule on the probability density w(r,t) of a Brownian particle moving in a succession of independent random hops with no local directional bias is given.
Book ChapterDOI
Amorphization in metallic systems
TL;DR: In this article, the thermodynamics of metastable phase formations are described, and different experimental routes into the amorphous state: hydriding, thin diffusion couples, and other driven systems.
Journal ArticleDOI
PbTe nanocrystal formation by interface mixing of Te/Pb bilayer using low energy ions
Srashti Gupta,D. C. Agarwal,Sumsullah Khan,Sonnathi Neeleshwar,Sunil Ojha,Sanjeev Kumar Srivastava,A. K. Tripathi,S. Amirthapandian,B. K. Panigrahi,D. K. Avasthi +9 more
TL;DR: PbTe nanocrystals are synthesized using low energy ion beam mixing of a Te/Pb bilayer on a Si substrate in this article, which reveals that local spherical thermal spike contributes significantly to the mixing process whereas the possibilities of mixing at interface by ballistic process and radiation enhanced diffusion are rather low.
Journal ArticleDOI
Structural and optical properties of AlN/Si system
TL;DR: In this paper, thin films of aluminum nitride were deposited by ion beam sputtering in an Ar-N2 atmosphere on Si (1.0.0) for film preparation, the N2 flow was kept at 5 sccm and the ratio of N2 and Ar was 4:1.
Journal ArticleDOI
Sputtering of TiN coatings during ion beam mixing
TL;DR: In this paper, thin TiN films deposited via magnetron sputtering on stainless steel were ion mixed with krypton ions of energies 80-250 keV. Sputtering yields and mixing rates were determined from the titanium and nitrogen depth profiles measured by Rutherford backscattering and resonant nuclear reaction analysis.
References
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Journal ArticleDOI
Handbook of Mathematical Functions
Journal ArticleDOI
Theory of Sputtering. I. Sputtering Yield of Amorphous and Polycrystalline Targets
TL;DR: In this article, an integrodifferential equation for the sputtering yield is developed from the general Boltzmann transport equation, and solutions of the integral equation are given that are asymptotically exact in the limit of high ion energy as compared to atomic binding energies.
Journal ArticleDOI
The depth resolution of sputter profiling
TL;DR: In this article, it is shown that the bulk radiation damage accompanying sputtering events sets ultimate limits to the depth resolution attainable in sputter profiling, and guidelines for selection of projectile species and energies to minimize such mixing are given and numerical estimates for attainable depth resolutions.