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Theoretical aspects of atomic mixing by ion beams

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TLDR
In this paper, the half-widths of matrix relocation profiles were determined explicitly for ion-impurity knockon events (recoil implantation) as well as isotropic cascade mixing.
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This article is published in Nuclear Instruments and Methods.The article was published on 1981-04-15. It has received 443 citations till now. The article focuses on the topics: Mixing (physics).

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Citations
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Journal ArticleDOI

Recoil implantation yields and depth profiles

TL;DR: In this paper, the authors derived analytical expressions for both primary and cascade recoil implantation yields and depth profiles and compared their predictions with those of other models, using multiple scattering theory.
Journal ArticleDOI

Ion irradiation stability of multilayered AlN/TiN nanocomposites

TL;DR: In this article, the structural changes in multilayered AlN/TiN nanocomposites upon Ar+ ion irradiation were investigated, and it was found that this immiscible system exhibits high ion radiation stability, the AlN and TiN layers remaining well separated, with sharp interfaces.
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Ion beam mixing of U-based bilayers

TL;DR: In this paper, an ion beam was mixed with 400 keV Ar and U/Al with Xe ions at doses from 2 × 1015 to 1 × 1017 ions/cm2.
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Atomic transport in hot ion tracks

TL;DR: In this article, it was shown that the strong mixing observed after high energy irradiation is most likely due to the interdiffusion in the molten ion track, based on the fact that the track formation threshold in both interface forming materials must be exceeded for effective interdiffusions and, even more, that the estimated diffusion constants compare with liquid rather than solid state diffusion.
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Irradiation effects in Cu/W multilayers: Ion beam mixing and structural evolution

TL;DR: In this article, the authors investigated the effects of irradiation on the immiscible Cu/W system for helium 70 keV and krypton 340 keV irradiations at liquid-nitrogen temperature.
References
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Journal ArticleDOI

Theory of Sputtering. I. Sputtering Yield of Amorphous and Polycrystalline Targets

TL;DR: In this article, an integrodifferential equation for the sputtering yield is developed from the general Boltzmann transport equation, and solutions of the integral equation are given that are asymptotically exact in the limit of high ion energy as compared to atomic binding energies.
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The depth resolution of sputter profiling

TL;DR: In this article, it is shown that the bulk radiation damage accompanying sputtering events sets ultimate limits to the depth resolution attainable in sputter profiling, and guidelines for selection of projectile species and energies to minimize such mixing are given and numerical estimates for attainable depth resolutions.
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