Journal ArticleDOI
Theoretical aspects of atomic mixing by ion beams
Peter Sigmund,A. Gras-Marti +1 more
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In this paper, the half-widths of matrix relocation profiles were determined explicitly for ion-impurity knockon events (recoil implantation) as well as isotropic cascade mixing.About:
This article is published in Nuclear Instruments and Methods.The article was published on 1981-04-15. It has received 443 citations till now. The article focuses on the topics: Mixing (physics).read more
Citations
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Journal ArticleDOI
Flux dependent MeV self-ion- induced effects on Au nanostructures: Dramatic mass transport and nano-silicide formation
Jay Ghatak,M. Umananda Bhatta,B. Sundaravel,K.G.M. Nair,Sz-Chian Liou,Cheng-Hsuan Chen,Yuh-Lin Wang,Parlapalli V. Satyam +7 more
TL;DR: The unusual mass transport is found to be associated with the formation of gold silicide nano-alloys at subsurfaces and is explained on the basis of thermal effects and the creation of rapid diffusion paths in the nanoscale regime during the course of ion irradiation.
Journal ArticleDOI
Flux dependent MeV self-ion-induced effects on Au nanostructures: dramatic mass transport and nanosilicide formation.
Jay Ghatak,M. Umananda Bhatta,B. Sundaravel,K.G.M. Nair,Sz-Chian Liou,Cheng-Hsuan Chen,Yuh-Lin Wang,Parlapalli V. Satyam +7 more
TL;DR: In this paper, the authors reported a direct observation of dramatic mass transport due to 1.5 MeV Au2+ ion impact on isolated Au nanostructures of average size ≈7.6 nm and height ≈6.9 nm that are deposited on Si(111) substrate under high flux (3.2 × 1010−6.3 × 1012 ions cm−2 s−1) conditions.
Journal ArticleDOI
Ion-beam induced atomic transport at the Sb/Ni interface
TL;DR: In this paper, the authors investigated ion-beam mixing at the Sb/Ni interface with a wide range of ions (He, Ne, Ar, Xe, Pb) and beam energies (40-900 keV).
Book ChapterDOI
Disturbing Effects in Sputter Profiling
TL;DR: In this article, the distribution of the elemental composition of a sample versus its distance perpendicular to the original surface is obtained by sputter depth profiling using ion bombardment in combination with a suitable analysis technique.
Journal ArticleDOI
Amorphization of In/Au-bilayers by low temperature ion beam mixing
TL;DR: In this article, the mixing efficiencies extracted from the sputter-corrected resistance data are found to be temperature-independent for TS ≤ 180 K and are consistent with the predictions of the thermal spike model.
References
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Journal ArticleDOI
Handbook of Mathematical Functions
Journal ArticleDOI
Theory of Sputtering. I. Sputtering Yield of Amorphous and Polycrystalline Targets
TL;DR: In this article, an integrodifferential equation for the sputtering yield is developed from the general Boltzmann transport equation, and solutions of the integral equation are given that are asymptotically exact in the limit of high ion energy as compared to atomic binding energies.
Journal ArticleDOI
The depth resolution of sputter profiling
TL;DR: In this article, it is shown that the bulk radiation damage accompanying sputtering events sets ultimate limits to the depth resolution attainable in sputter profiling, and guidelines for selection of projectile species and energies to minimize such mixing are given and numerical estimates for attainable depth resolutions.