scispace - formally typeset
D

Deren Yang

Researcher at Zhejiang University

Publications -  998
Citations -  26247

Deren Yang is an academic researcher from Zhejiang University. The author has contributed to research in topics: Silicon & Doping. The author has an hindex of 71, co-authored 944 publications receiving 22268 citations. Previous affiliations of Deren Yang include Zhejiang Sci-Tech University.

Papers
More filters
Journal ArticleDOI

Scanning infrared microscopy investigation of copper precipitation in cast multicrystalline silicon

TL;DR: In this article, the behavior of copper precipitation in cast multicrystalline silicon (mc-Si) annealed at different temperatures under air cooling (30 K/s) or slow cooling (0.3 k/s), was investigated by scanning infrared microscopy (SIRM).
Journal ArticleDOI

Variations of high-pressure thermoelectric and mechanical properties of Si single crystals under doping with N and P–T pre-treatment

TL;DR: A set of Czochralski-grown Si (Cz-Si) single crystals doped with nitrogen N and P-T pre-treated has been characterized using thermoelectric power measurements at room temperature under ultrahigh pressure P (0−20 GPa) as discussed by the authors.
Journal ArticleDOI

Density functional theory study of the impact of tin doping on oxygen diffusion in Czochralski silicon

TL;DR: In this article, the impact of tin doping on interstitial oxygen diffusion in Czochralski silicon is investigated by density functional theory (DFT) calculations, where two aspects are taken into consideration: (i) Sn induced lattice strain and lattice expansion; (ii) direct and vacancy-mediated interaction between Sn and Oi atoms.
Journal ArticleDOI

Synthesis and characterization of CdS based sulfide coaxial cable and nanotubes by sacrificial approach

TL;DR: In this paper, the morphology and structure of the nanomaterials have been characterized by X-ray powder diffraction (XRD), transmission electron microscopy (TEM) and selected area electron diffraction(SAED) pattern.
Journal ArticleDOI

Effect of nitrogen doping on denuded zone formed by rapid thermal process in Czochralski silicon wafer

TL;DR: In this article, the nitrogen-doped Czochralski (NCZ) silicon wafer was compared with the conventional CZ silicon, and it was proved that the nitrogen doping does not affect the formation of defect-free DZ by the RTP-based internal gettering (IG) process.