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Deren Yang

Researcher at Zhejiang University

Publications -  998
Citations -  26247

Deren Yang is an academic researcher from Zhejiang University. The author has contributed to research in topics: Silicon & Doping. The author has an hindex of 71, co-authored 944 publications receiving 22268 citations. Previous affiliations of Deren Yang include Zhejiang Sci-Tech University.

Papers
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Proceedings ArticleDOI

Synthesis of boron and boride compounds nanowire arrays by chemical vapor deposition

TL;DR: Aligned single crystal boron nanowires (BNWs) were fabricated by CVD process in nano-channel Al/sub 2/O/sub 3/ (NCA) substrates at 800/spl deg/C.
Journal ArticleDOI

Electrical properties of oxygen precipitate-related defects in Czochralski silicon

TL;DR: In this paper , electron-beam-induced current (EBIC) and deep-level transient spectroscopy (DLTS) were used to study the electronic properties of oxygen precipitates and their induced dislocations in Czochralski (Cz) silicon.
Journal ArticleDOI

Hydrofluoric acid free synthesis of macropores on silicon by chemical vapor deposition and their photoluminescence

TL;DR: A novel hydrofluoric acid (HF) free atmospheric pressure chemical vapor deposition (APCVD) method has been developed to synthesize macropores on silicon Field emission scanning electron microscopy (FESEM), X-ray powder diffraction (XRD) and energy-dispersive Xray (EDX) spectrum indicate that the composition of macropore with the diameters of several hundred nanometers is silica as discussed by the authors.
Patent

Process for inner absorption of impurities in czochralski silicon wafer

TL;DR: In this article, a process for inner absorption of impurities in a Czochralski silicon wafer is described, which consists of two steps of heat treatment, with the temperature and time required being lower than in the prior art and the thermal budget significantly reduced.
Proceedings ArticleDOI

Correlation of oxygen precipitation and void annihilation in nitrogen-doped Czochralski silicon

TL;DR: In this article, the effect of oxygen precipitation on the annihilation of voids in nitrogen-doped Czochralski (NCZ) silicon wafers has been investigated.