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Deren Yang

Researcher at Zhejiang University

Publications -  998
Citations -  26247

Deren Yang is an academic researcher from Zhejiang University. The author has contributed to research in topics: Silicon & Doping. The author has an hindex of 71, co-authored 944 publications receiving 22268 citations. Previous affiliations of Deren Yang include Zhejiang Sci-Tech University.

Papers
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Journal ArticleDOI

Effect of scattering from localized surface plasmon resonance on improving the luminescence efficiency of silicon nitride light-emitting devices

TL;DR: In this article, localized surface plasmon resonance enhanced silicon-rich silicon nitride based light-emitting devices by embedding the silver nanostructures between the silicon substrate and luminescent matrix were demonstrated.
Journal ArticleDOI

Defects in TiO2 films on p+-Si studied by positron annihilation spectroscopy

TL;DR: In this paper, a variable-energy positron annihilation spectroscopy was applied to the study of defects in TiO 2 / p + -Si structures, in the as-grown state and after annealing in vacuum and in hydrogen, to investigate whether annaling (and film thickness) resulted in an increase of vacancy-type defects in the oxide films.
Journal ArticleDOI

Jan Vanhellemont – 35 years of materials research in microelectronics

TL;DR: In this paper, a brief overview of Vanhellemont's scientific career, covering more than 35 years in semiconductor materials science, is given in this paper, where the main scientific highlights are summarized, including different positions he has taken in his career at different universities and companies, he has also been very active in establishing a worldwide network of collaborations and contacts, who often became also good friends.
Proceedings ArticleDOI

Silver nanoshells plasmonically controlled random lasing without dielectric spacer

TL;DR: In this article, the random lasing properties of dye solutions suspended with silver nanoshells are investigated, and the results suggest that Ag nanostructures present a new approach towards well-controlled random lasers.
Patent

Method for purifying metal silicon by oxidation treatment

TL;DR: In this paper, a method for purifying metal silicon by oxidation treatment, comprising the following steps: removing oil of metal silicon, cleaning and drying; then heating under the oxygen atmosphere, preserving temperature, reducing temperature, then preserving temperature and then cooling; and finally, using deionized water to clean to obtain high-grade metal silicon with the purity of 4 to 5N after soaking with mixed solution of hydrochloric acid and hydrofluoric acid.