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Deren Yang

Researcher at Zhejiang University

Publications -  998
Citations -  26247

Deren Yang is an academic researcher from Zhejiang University. The author has contributed to research in topics: Silicon & Doping. The author has an hindex of 71, co-authored 944 publications receiving 22268 citations. Previous affiliations of Deren Yang include Zhejiang Sci-Tech University.

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Extended defects in nitrogen-doped Czochralski silicon during diode process

TL;DR: In this paper, the extended defects in nitrogen-doped Czochralski (NCZ) and conventional CZochralki (CZ) silicon during the diode process were systematically investigated by means of optical microscopy and transmission electron microscopy.
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Monocrystalline silicon used for integrated circuits:still on the way

TL;DR: In this paper, the recent developments in the controlling of large diameter silicon crystal growth processes, the improvement of material features by co-doping with the intend-introduced impurities, and the progress of defect engineered silicon wafers (epitaxial silicon wafer, strained silicon, silicon on insulator) are reviewed.
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Formation of shallow junctions in gallium and phosphorus compensated silicon for cell performance improvement

TL;DR: In this article, the authors used gallium and phosphorus compensated Czochralski silicon wafer and found that the cell efficiencies under 1 sun illumination are on average 0.2% higher than those of conventional solar cells.
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Revealing the Defects Introduced in N- or Ge-doped Cz-Si by γ Irradiation and High Temperature-High Pressure Treatment

TL;DR: In this paper, the authors proposed a method to solve the problem of high energy consumption in the case of a nuclear power plant in Warsaw, Poland, by using an energy-efficient particle accelerator.
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Defect-related electroluminescence from metal-oxide-semiconductor devices with ZrO2 films on silicon

TL;DR: In this paper, defect-related electroluminescence (EL) from ZrO2 films annealed under different atmosphere has been realized by means of electrical pumping scheme of metal-oxide-semiconductor (MOS) devices.