V
Veena Misra
Researcher at North Carolina State University
Publications - 251
Citations - 5283
Veena Misra is an academic researcher from North Carolina State University. The author has contributed to research in topics: Gate dielectric & Dielectric. The author has an hindex of 39, co-authored 249 publications receiving 4954 citations. Previous affiliations of Veena Misra include University of North Carolina at Chapel Hill & Motorola.
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Transparent indium gallium zinc oxide transistor based floating gate memory with platinum nanoparticles in the gate dielectric
TL;DR: In this paper, a transparent memory device has been developed based on an indium gallium zinc oxide thin film transistor by incorporating platinum nanoparticles in the gate dielectric stack as the charge storage medium.
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Mobile health: the power of wearables, sensors, and apps to transform clinical trials
Bernard H. Munos,Pamela C. Baker,Brian M. Bot,Michelle Crouthamel,Glen de Vries,Ian Ferguson,John D. Hixson,Linda A. Malek,John J. Mastrototaro,Veena Misra,Aydogan Ozcan,Leonard V. Sacks,Pei Wang +12 more
TL;DR: This report explores the promise that wearable biosensors, along with integrated mobile apps, hold for improving the quality of patient care and clinical outcomes and the broad societal implications of using mobile health technologies.
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Electrical properties of Ru-based alloy gate electrodes for dual metal gate Si-CMOS
TL;DR: In this paper, low resistivity Ru and Ru-Ta alloy films, deposited via reactive sputtering, were evaluated as gate electrodes for p- and n-MOSFET devices, respectively.
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Use of metal–oxide–semiconductor capacitors to detect interactions of Hf and Zr gate electrodes with SiO2 and ZrO2
TL;DR: In this article, metal-oxide-semiconductor capacitors were used to study the interaction of Hf and Zr gate electrodes on SiO2, ZrSixOy, and zrO2.
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Issues in High-ĸ Gate Stack Interfaces
TL;DR: In this article, the authors address current challenges in the fundamental understanding of physical and chemical processes that occur in the fabrication of the transistor gate stack structure, including the interface between bulk silicon and high-dielectric-constant (high-ĸ) insulators, and internal interfaces that form within dielectric stacks with nonuniform material and structure compositions.