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Wolfgang Fichtner

Researcher at ETH Zurich

Publications -  403
Citations -  10716

Wolfgang Fichtner is an academic researcher from ETH Zurich. The author has contributed to research in topics: Very-large-scale integration & Power semiconductor device. The author has an hindex of 48, co-authored 401 publications receiving 10251 citations. Previous affiliations of Wolfgang Fichtner include Bell Labs & École Polytechnique Fédérale de Lausanne.

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A novel built-in methodology for screening LDMOS transistors to achieve zero defects in the automotive environment

TL;DR: In this paper, a built-in reliability testing methodology to screen out gate oxide and crystal related defects in Lateral Diffused MOS transistors is presented, which is based on an embedded circuitry that includes logic control, high voltage generation, and leakage current monitoring.
Proceedings ArticleDOI

Numerical method for the calculation of self-consistent charge densities of reservoir-coupled quantum dots

TL;DR: In this paper, the authors present a numerical method for the calculation of self-consistent electron densities in a quantum dot weakly coupled to a macroscopic reservoir using a multidimensional secant approach that partially overcomes the numerical limitations intrinsic to single-electron transistor device simulations.
Proceedings ArticleDOI

A parametrizable hybrid stack-register processor as soft intellectual property module

TL;DR: An enhanced register-based RISC processor, which is capable of launching every interrupt routine within two clock cycles, is presented, which features a customizable instruction set, extensive parameterization, and a synthesis model with separate core and interfaces.
Proceedings ArticleDOI

New developments and old problems in grid generation and adaptation for TCAD applications

TL;DR: A review of new developments in multi-dimensional mesh generation for TCAD applications is presented in this article, focusing on several specific areas such as promising new algorithms for device mesh generation and grid adaptation for process and device applications.