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Electrical and optical properties of gold-doped n-type silicon

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TLDR
In this paper, the authors used different measurement techniques, both electrical and optical, to characterize gold diffusion in n-type, float-zoned silicon in the temperature range 600-1150°C and found that high temperatures and long times for gold diffusion change the conductivity type in the samples from n to p.
Abstract
Different measurement techniques, both electrical and optical, were utilized in this work to characterize gold diffusion in n‐type, float‐zoned silicon in the temperature range 600–1150 °C. In the lower temperature region (≤750 °C), the gold diffusion is observed by the introduction of the Au acceptor state at 0.53 eV below the conduction band, and is correlated to the electrical behavior of the samples deduced from Hall effect and resistivity data. Also, the effects of Au diffusion on the free‐carrier concentration and mobilities are discussed. It was shown that high temperatures and long times for gold diffusion change the conductivity type in the samples from n to p. In the samples that converted to p type, a limiting room‐temperature resistivity of 2.0×103 Ω cm was attained, when the conduction is mainly influenced by the Au‐related deep electronic states in the band gap. In this case, the diffusion mechanism is also investigated by secondary ion mass spectroscopy data determining the equilibrium Au solubility, which is close to the equilibrium solubility of interstitial gold. Low‐temperature photoluminescence measurements have shown that the intensity of the lines often attributed to dislocations, increases significantly by gold diffusion in the lower temperature region. At higher diffusion temperatures, a decrease of the dislocation‐related lines was found, associated with formation of gold‐related precipitates. Introducing an inhomogeneous internal stress distribution in the Si matrix, these precipitates cause line shifts as well as line broadenings of the free exciton, the phosphorus bound exciton, and the electron‐hole droplet photoluminescence emissions. The concentration of substitutional phosphorus is found to decrease with increasing diffusion temperatures.

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Citations
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Journal ArticleDOI

Room-temperature sub-band gap optoelectronic response of hyperdoped silicon

TL;DR: In this article, a rapid and repeatable laser-based hyperdoping method incorporating supersaturated gold dopant concentrations on the order of 10(20) cm(-3) into a single-crystal surface layer was proposed to induce room-temperature infrared subband gap photoresponse in silicon.
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Host defence capacities of pulmonary surfactant: evidence for 'non-surfactant' functions of the surfactant system

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Identification of band‐gap states by deep level transient spectroscopy on radioactive probes: The case of Au and Pt in silicon

TL;DR: In this paper, the authors applied the deep level transient spectroscopy technique to silicon doped with radioactive impurities and showed that the disappearance or appearance of features in the spectra following the transmutation of the incorporated radioactive atoms identifies an impurity involved in the centers observed.
Journal ArticleDOI

Carrier Profiling of Individual Si Nanowires by Scanning Spreading Resistance Microscopy

TL;DR: Individual silicon nanowires (NWs) doped either by ion implantation or by in situ dopant incorporation during NW growth were investigated by scanning spreading resistance microscopy (SSRM).
Journal ArticleDOI

Recombination dynamics of spatially confined electron-hole system in luminescent gold catalyzed silicon nanowires.

TL;DR: It is demonstrated that intrinsic Auger recombination governs the recombination dynamic of the dense e-h plasma generated inside the NW, which means that the Au-SiNW electronic properties are highly comparable to those of bulk silicon crystal.
References
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Journal ArticleDOI

Dislocation-Related Photoluminescence in Silicon

TL;DR: In this article, the authors studied the photoluminescence in silicon, deformed in a well-defined and reproducible way, and showed that high-temperature, high-stress deformation results in sharp spectra of the D 1 through D 4 lines as described in the literature.
Journal ArticleDOI

Properties of gold in silicon

TL;DR: The electrical properties, solubility and diffusion characteristics of gold in silicon are reviewed in this article, where it is observed that theoretical calculations and experimental measurements of the effect of added gold on the resistivity of silicon are not in agreement and that while some of the discrepancies occurring in n-type silicon can be explained, those appearing in the p-type case cannot be resolved at the present time.
Journal ArticleDOI

Mechanism and kinetics of the diffusion of gold in silicon

TL;DR: In this article, the authors show that the Frank-Turnbull model cannot explain the dependence of the diffusion of Au in Si wafers with self-interstitials and that the dominating intrinsic point defects in Si are not vacancies as in Ge or metals.
Journal ArticleDOI

Complex nature of gold-related deep levels in silicon

TL;DR: In this paper, thermal and optical properties of the well-known gold-acceptor level in silicon have been investigated, and it is shown that there are at least two (and perhaps more) different types of gold acceptor centers in silicon.
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