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Journal ArticleDOI

Recent Progress on 1.55- $\mu{\hbox {m}}$ Dilute-Nitride Lasers

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TLDR
In this article, a review of the recent developments in GaAs-based 1.55mum lasers grown by molecular beam epitaxy (MBE) is presented, including the nitrogen plasma conditions, ion removal from the nitrogen flux, surfactant- mediated growth, the roles of various V-II ratios, the growth temperature, the active region thermal budget, proper annealing, and composition.
Abstract
We review the recent developments in GaAs-based 1.55-mum lasers grown by molecular beam epitaxy (MBE). While materials growth is challenging, the growth window appears to be relatively broad and is described in detail. The key considerations for producing high-quality GalnNAsSb material emitting at 1.55-mum regime are examined, including the nitrogen plasma conditions, ion removal from the nitrogen flux, surfactant- mediated growth, the roles of various V-II ratios, the growth temperature, the active region thermal budget, proper annealing, and composition. We find that emission may be tuned throughout the 1.55-mum communications band without penalty to the optical quality varying only one parameter - the total growth rate. This powerful result is validated by the demonstration of low-threshold edge-emitting lasers throughout the 1.55-mum regime, including threshold current densities as low as 318 A/cm2 at 1.54 mum. Additional characterization by Z-parameter techniques, cavity length studies, and band offset measurements were performed to better understand the temperature stability of device performance. Lasing was extended as far as 1.63 mum under nonoptimized growth conditions. The GaAs-based dilute-nitrides are emerging as a very promising alternative to InP-based materials at 1.55-mum due to their high gain, greater range of achievable band offsets, as well as the availability of lattice-matched AlAs-GaAs materials and native oxide layers for vertical-cavity surface-emitting lasers (VCSELs). Indeed, this effort has enabled the first electrically injected C-band VCSEL on GaAs.

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Citations
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Journal ArticleDOI

Next-generation mid-infrared sources

TL;DR: In this article, the authors present an overview of the current state-of-the-art mid-IR sources, in particular thermal emitters, which have long been utilized, and the relatively new quantumand interband-cascade lasers, as well as the applications served by these sources.
Journal ArticleDOI

Photoreflectance, photoluminescence, and microphotoluminescence study of optical transitions between delocalized and localized states in GaN 0.02 As 0.98 , Ga 0.95 In 0.05 N 0.02 As 0.98 , and GaN 0.02 As 0.90 Sb 0.08 layers

TL;DR: In this paper, a broadening of optical transitions in as-grown and annealed GaN, GaN 0.95 and GaN0.08 alloys were studied with photoreflectance (PR), photoluminescence (PL), and microphotoluminecence (\ensuremath{\mu}PL) in a broad range of temperatures.
Journal ArticleDOI

8-band and 14-band kp modeling of electronic band structure and material gain in Ga(In)AsBi quantum wells grown on GaAs and InP substrates

TL;DR: In this article, the electronic band structure and material gain have been calculated for GaAsBi/GaAs quantum wells (QWs) with various bismuth concentrations (Bi ≥ 15%) within the 8-band and 14-band kp models.
Journal ArticleDOI

High-power disk lasers based on dilute nitride heterostructures

TL;DR: In this article, the InGaAsN-based gain mirrors for high-power optically pumped semiconductor disk lasers with direct emission at wavelengths around 1180nm were fabricated by molecular beam epitaxy.
Journal ArticleDOI

Bandgap engineering in III-nitrides with boron and group V elements: Toward applications in ultraviolet emitters

TL;DR: In this paper, a comprehensive review of this activity is presented, including an up-to-date compilation of material parameters for wurtzite boron nitride; its alloying with other III-nitrides, including structural and optical characterization; the band anticrossing model for III-nodes diluted with group V atoms; their synthesis and structural and Optical characterization; and examples of applications of 3-nide alloys containing Boron and group V atom in semiconductor devices.
References
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Journal ArticleDOI

GaInNAs: A Novel Material for Long-Wavelength-Range Laser Diodes with Excellent High-Temperature Performance

TL;DR: In this paper, a novel material, GaInNAs, that can be formed on GaAs to drastically improve the temperature characteristics in long-wavelength-range laser diodes is proposed.
Book

Organometallic Vapor-Phase Epitaxy: Theory and Practice

TL;DR: The OMVPE process as mentioned in this paper is a process of physical processes occurring on the surface of the Earth, and it has been used in many applications in the computer science community, e.g. superlattice structures.
Journal ArticleDOI

Red Shift of Photoluminescence and Absorption in Dilute GaAsN Alloy Layers

TL;DR: In this paper, the optical properties of dilute GaAS1-xNx alloys have been reported and the authors assign the photoluminescence to band-edge transitions and not to isolated N-N pair emission.
Journal ArticleDOI

GaInNAs: a novel material for long-wavelength semiconductor lasers

TL;DR: In this paper, the authors used a gas-source molecular beam epitaxy in which a nitrogen radical was used as the nitrogen source to grow a light-emitting material with a bandgap energy suitable for longwavelength laser diodes.
Journal ArticleDOI

Mechanism for low-temperature photoluminescence in GaNAs/GaAs structures grown by molecular-beam epitaxy

TL;DR: The mechanism for low-temperature photoluminescence (PL) emissions in GaNAs epilayers and GaAs/GaNxAs1−x quantum well (QW) structures grown by molecular-beam epitaxy is studied in detail, employing PL, PL excitation, and time-resolved PL spectroscopies as discussed by the authors.
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