Step & flash imprint lithography
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TLDR
The step and flash imprint lithography (S-FIL) process as mentioned in this paper uses a quartz template for optical alignment of the wafer and template, which opens up the potential to do precise overlay.About:
This article is published in Materials Today.The article was published on 2005-02-01 and is currently open access. It has received 119 citations till now. The article focuses on the topics: Next-generation lithography & Lithography.read more
Citations
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Journal ArticleDOI
Templated Self‐Assembly of Block Copolymers: Top‐Down Helps Bottom‐Up
TL;DR: Templated self-assembly of block copolymers as discussed by the authors provides a path towards the rational design of hierarchical device structures with periodic features that cover several length scales, and provides a promising route to control bottom-up self-organization processes through top-down lithographic templates.
Journal ArticleDOI
Block Copolymer Lithography
Christopher M. Bates,Michael J. Maher,Dustin W. Janes,Christopher J. Ellison,C. Grant Willson +4 more
TL;DR: In this article, the current state of block copolymer lithography and key challenges and opportunities within the field are discussed, focusing on advances and issues related to thermal annealing.
Journal ArticleDOI
Designer nanoparticles: Incorporating size, shape and triggered release into nanoscale drug carriers
TL;DR: The integration of responsive biomaterials into shape-specific nanocarriers is one of the most promising avenues towards the development of next generation, advanced drug delivery systems.
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Degradable thermosets based on labile bonds or linkages: A review
Songqi Ma,Dean C. Webster +1 more
TL;DR: Degradable thermosets as discussed by the authors have been proposed as a useful route to obtain thermoset recyclability and enable the recycling of valuable components that may be encapsulated in thermoplastic polymers.
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Micro- and nanotechnologies for intelligent and responsive biomaterial-based medical systems.
TL;DR: Improvements in micro- and nano-fabrication technologies have enhanced the ability to create better performing therapeutic systems for numerous pathophysiological applications, and MEMS- and NEMS-based tissue regeneration scaffolds, biosensors, and drug delivery devices provide new opportunities to mimic the natural intelligence and response of biological systems.
References
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Proceedings ArticleDOI
Step and flash imprint lithography: a new approach to high-resolution patterning
Matthew E. Colburn,Stephen C. Johnson,Michael D. Stewart,S. Damle,Todd Bailey,Bernard Choi,M. Wedlake,Timothy Michaelson,Sidlgata V. Sreenivasan,John G. Ekerdt,C. Grant Willson +10 more
TL;DR: In this article, a template is created on a standard mask blank by using the patterned chromium as an etch mask to produce high-resolution relief images in the quartz.
Journal ArticleDOI
Template fabrication schemes for step and flash imprint lithography
Todd Bailey,D. J. Resnick,David P. Mancini,Kevin J. Nordquist,William J. Dauksher,Eric S. Ainley,A. Alec Talin,K. Gehoski,Jeffrey H. Baker,Byung Jin Choi,S. Johnson,Matthew E. Colburn,M. Meissl,Sidlgata V. Sreenivasan,John G. Ekerdt,Carlton G Willson +15 more
TL;DR: In this article, the authors investigate alternative processes for defining features on an SFIL template using a much thinner template, which has the advantage that the template is transparent, thereby facilitating conventional overlay techniques.
Proceedings ArticleDOI
Step and Repeat UV nanoimprint lithography tools and processes
Ian M. Mcmackin,Jin Choi,Philip D. Schumaker,Van Nguyen,Frank Y. Xu,Ecron Thompson,Daniel A. Babbs,Sidlgata V. Sreenivasan,Michael Watts,Norman E. Schumaker +9 more
TL;DR: In this paper, the current status of the S-FIL tool and process technology is presented, including residual layer control, etch process development, patterning of lines, contacts and posts, and CD control.
Journal ArticleDOI
Characterization of and imprint results using indium tin oxide-based step and flash imprint lithography templates
William J. Dauksher,Kevin J. Nordquist,David P. Mancini,D. J. Resnick,Jeffrey H. Baker,Andy E. Hooper,A. Alec Talin,Todd Bailey,A. M. Lemonds,Sidlgata V. Sreenivasan,John G. Ekerdt,Carlton G Willson +11 more
TL;DR: In this article, indium tin oxide-based (ITO-based) step and flash imprint lithography templates offer advantages in terms of electron-beam writing, scanning electron microscope inspection, and pattern transfer.
Proceedings ArticleDOI
High-resolution templates for step and flash imprint lithography
Douglas J. Resnick,William J. Dauksher,David P. Mancini,Kevin J. Nordquist,Eric S. Ainley,Kathleen A. Gehoski,Jeff H. Baker,Todd Bailey,Byung Jin Choi,Stephen C. Johnson,Sidlgata V. Sreenivasan,John G. Ekerdt,C. Grant Willson +12 more
TL;DR: In this paper, two methods for fabricating high resolution SFIL templates were considered, one using a very thin layer of Cr as a hard mask and the other using a conductive and transparent layer of indium tin oxide (ITO) on the glass substrate.