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Two-micron-wavelength germanium-tin photodiodes with low dark current and gigahertz bandwidth.

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TLDR
A germanium-tin (Ge0.9Sn0.1) multiple-quantum-well p-i-n photodiode on silicon (Si) substrate for 2 μm-wavelength light detection is demonstrated and a 3 dB bandwidth of around 1.2 GHz is achieved in Ge1-xSnx photodetectors operating at 2μm.
Abstract
We report the demonstration of a germanium-tin (Ge0.9Sn0.1) multiple-quantum-well p-i-n photodiode on silicon (Si) substrate for 2 μm-wavelength light detection. Characterization of the photodetector in both direct current (DC) and radio frequency (RF) regimes was performed. At the bias voltage of -1 V, a dark current density of 0.031 A/cm2 is realized at room-temperature, which is among the lowest reported values for Ge1-xSnx-on-Si p-i-n photodiodes. In addition, for the first time, a 3 dB bandwidth (f3dB) of around 1.2 GHz is achieved in Ge1-xSnx photodetectors operating at 2 μm. It is anticipated that further device optimization would extend the f3dB to above 10 GHz.

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Citations
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Journal ArticleDOI

High-speed photo detection at two-micron-wavelength: technology enablement by GeSn/Ge multiple-quantum-well photodiode on 300 mm Si substrate.

TL;DR: The potential for using GeSn to extend the utility of Si photonics in 2 µm band integrated optical transceivers for communication applications is illustrated by high-speed photo detection at two-micron-wavelength achieved by a GeSn/Ge multiple-quantum-well (MQW) p-i-n photodiode.
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References
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Journal ArticleDOI

Statistics of the Recombinations of Holes and Electrons

TL;DR: In this article, the statistics of the recombination of holes and electrons in semiconductors were analyzed on the basis of a model in which the recombinations occurred through the mechanism of trapping.
Journal ArticleDOI

Strong quantum-confined Stark effect in germanium quantum-well structures on silicon

TL;DR: The discovery of the QCSE, at room temperature, in thin germanium quantum-well structures grown on silicon is very promising for small, high-speed, low-power optical output devices fully compatible with silicon electronics manufacture.
Journal ArticleDOI

High-quality Ge epilayers on Si with low threading-dislocation densities

TL;DR: In this paper, a two-step ultrahigh vacuum/chemical-vapor-deposition process followed by cyclic thermal annealing was proposed for making high-quality epilayers on Si.
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