Journal ArticleDOI
Ultrathin zirconium oxide films as alternative gate dielectrics
TLDR
In this paper, the dielectric constant of ZrO2 achieved in this work is 15-18 with very small capacitance-voltage hysteresis, ideal for metaloxide-semiconductor field effect transistor (MOSFET) application.Abstract:
ZrO2 films were deposited on Si(100) wafers by the rapid thermal chemical vapor deposition process using a zirconium (IV) t-butoxide Zr(OC4H9)4 precursor and oxygen. Interfacial zirconium silicate formation was observed by high resolution transmission electron microscopy and medium energy ion scattering. The intermixing of the interface can be suppressed by forming a thin silicon nitride layer on the silicon substrate prior to ZrO2 deposition. The dielectric constant of ZrO2 achieved in this work is 15–18 with very small capacitance–voltage hysteresis, ideal for metal–oxide–semiconductor field effect transistor (MOSFET) application. The NMOSFET device has good turn-on characteristics, however, the transconductance is lower than expected due to the incomplete removal of zirconium silicate at the source and drain contacts and poses integration challenges to use ZrO2 as the gate dielectric material.read more
Citations
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Journal ArticleDOI
Effect of Zr addition on ZnSnO thin-film transistors using a solution process
TL;DR: In this article, a ZrZnSnO (ZZTO) channel layer was fabricated using a solution process and a ZZTO TFT with a high mobility of a 4.02 cm2
Journal ArticleDOI
Growth and Properties of Hybrid Organic‐Inorganic Metalcone Films Using Molecular Layer Deposition Techniques
TL;DR: In this paper, the authors focus on the use of molecular layer deposition (MLD) for fabricating hybrid organic-inorganic thin fi lms, such as the metalcones, which have tunable chemical, optical, mechanical, and electrical properties.
Journal ArticleDOI
First-principles exploration of alternative gate dielectrics: Electronic structure of ZrO 2 /Si and ZrSiO 4 /Si interfaces
TL;DR: In this paper, first principles simulations using density functional theory within the local density approximation were employed to investigate the electronic properties of the interfaces between tetragonal zirconia and a silicon substrate.
Journal ArticleDOI
Estimation and control of surface roughness in thin film growth using kinetic Monte-Carlo models
TL;DR: In this article, a roughness estimator is constructed that allows computing estimates of the surface roughness at a time-scale comparable to the real-time evolution of the process using discrete on-line roughness measurements.
Journal ArticleDOI
Valence band structure and band alignment at the ZrO2/Si interface
TL;DR: In this paper, X-ray photoelectron spectroscopy combined with first-principles simulations are used to determine the band alignments of ZrO2 thin films on silicon.
References
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An investigation of surface states at a silicon/silicon oxide interface employing metal-oxide-silicon diodes
TL;DR: In this article, the M-O-S diode was introduced, and a theory for its operation in the absence of surface states was obtained, and it was shown that surface states with non-zero relaxation times may increase the capacitance of the device, as well as affect the proportion of applied voltage which appears across the silicon.
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Crystalline Oxides on Silicon: The First Five Monolayers
TL;DR: In this paper, a metaloxide-semiconductor capacitor using SrTiO{sub 3} as an alternative to SiOthinsp{sub 2} yields the extraordinary result of t{sub eqlt}10 {Angstrom}.
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Structure and stability of ultrathin zirconium oxide layers on Si(001)
TL;DR: In this paper, the structure of ultrathin ZrO2 layers on Si(001) using medium energy ion scattering and cross-sectional transmission electron microscopy was examined.
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Tantalum pentoxide (Ta2O5) thin films for advanced dielectric applications
TL;DR: In this article, the authors present the present knowledge on tantalum pentoxide (Ta 2 O 5 ) thin films and their applications in the field of microelectronics and integrated microtechnologies.
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Thermal stability and electrical characteristics of ultrathin hafnium oxide gate dielectric reoxidized with rapid thermal annealing
TL;DR: In this article, the dielectric properties of ultrathin hafnium oxide reoxidized with rapid thermal annealing (RTA) have been investigated and the leakage current was found to be less than 3×10−2 ǫA/cm2 at −1.5 V (i.e., ∼2 V below VFB).